Magnanelli Timothy J, Heilweil Edwin J
Opt Express. 2020 Mar 2;28(5):7221-7236. doi: 10.1364/OE.382840.
Low density charge mobility from below bandgap, two-photon photoexcitation of bulk silicon (Si) is interrogated using time-resolved terahertz spectroscopy (TRTS). Total charge mobility is measured as a function of excitation frequency and fluence (charge carrier density), cut angle, and innate doping levels. Frequency dependent complex photoconductivities are extracted using the Drude model to obtain average and DC-limit mobility and carrier scattering times. These dynamic parameters are compared to values from contact-based Hall, above bandgap photoexcitation, and comparable gallium arsenide (GaAs) measurements. Mobilities are shown to increase beyond Hall values at low carrier densities and are modestly higher with increasing dopant density. The former occurs in part from below bandgap photoexcitation exhibiting abnormally small (faster) scattering times, while both reflect unique conduction characteristics at lowest (> 2x10 cm) carrier densities achieved through photodoping.
利用时间分辨太赫兹光谱(TRTS)研究了体硅(Si)在带隙以下的低密度电荷迁移率以及双光子光激发。测量了总电荷迁移率随激发频率、通量(电荷载流子密度)、切割角和固有掺杂水平的变化。使用德鲁德模型提取频率相关的复光电导率,以获得平均迁移率和直流极限迁移率以及载流子散射时间。将这些动态参数与基于接触的霍尔测量、带隙以上光激发以及类似的砷化镓(GaAs)测量值进行比较。结果表明,在低载流子密度下,迁移率超过霍尔值,并且随着掺杂剂密度的增加而略有升高。前者部分源于带隙以下光激发表现出异常小(更快)的散射时间,而两者都反映了通过光掺杂实现的最低(>2×10¹⁰ cm⁻³)载流子密度下独特的传导特性。