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金属辅助化学刻蚀法制备的硅纳米线中的载流子动力学。

Carrier dynamics in Si nanowires fabricated by metal-assisted chemical etching.

机构信息

Center of Super-Diamond and Advanced Films and Department of Physics and Materials Science, City University of Hong Kong, Hong Kong SAR, China.

出版信息

ACS Nano. 2012 Sep 25;6(9):7814-9. doi: 10.1021/nn301891s. Epub 2012 Aug 22.

Abstract

Silicon nanowire arrays fabricated by metal-assisted wet chemical etching have emerged as a promising architecture for solar energy harvesting applications. Here we investigate the dynamics and transport properties of photoexcited carriers in nanowires derived from an intrinsic silicon wafer using the terahertz (THz) time-domain spectroscopy. Both the dynamics and the pump fluence dependence of the photoinduced complex conductivity spectra up to several THz were measured. The photoinduced conductivity spectra follow a Lorentz dependence, arising from surface plasmon resonances in nanowires. The carrier lifetime was observed to approach 0.7 ns, which is limited primarily by surface trapping. The intrinsic carrier mobility was found to be ~1000 cm(2)/(V · s). Compared to other silicon nanostructures, these relative high values observed for both the carrier lifetime and mobility are the consequences of high crystallinity and surface quality of the nanowires fabricated by the metal-assisted wet chemical etching method.

摘要

采用金属辅助湿法刻蚀技术制备的硅纳米线阵列,因其在太阳能收集应用方面的巨大潜力而备受关注。在这里,我们利用太赫兹(THz)时域光谱技术研究了源自本征硅片的纳米线中光激发载流子的动力学和输运特性。我们测量了高达几个太赫兹的光致复电导率光谱的动力学和泵浦强度依赖性。光致电导率光谱呈现出洛伦兹依赖性,这是由于纳米线中的表面等离子体共振引起的。观察到载流子寿命接近 0.7 ns,这主要受到表面捕获的限制。本征载流子迁移率被发现约为 1000 cm²/(V·s)。与其他硅纳米结构相比,这种相对较高的载流子寿命和迁移率值是由金属辅助湿法刻蚀方法制备的纳米线具有的高结晶度和表面质量所导致的。

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