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用于可植入导电结构的氧化铝基片上溅射薄膜铂表面金属化的实验评估设计

Design of experiment evaluation of sputtered thin film platinum surface metallization on alumina substrate for implantable conductive structures.

作者信息

Kiele P, Cvancara P, Mueller M, Stieglitz T

出版信息

Annu Int Conf IEEE Eng Med Biol Soc. 2017 Jul;2017:1066-1069. doi: 10.1109/EMBC.2017.8037011.

Abstract

Reliability and reproducibility of implants and their fabrication are highly depending on the assembly and packaging procedures. Individual fabrication skills like soldering introduce inaccuracies and should be avoided as much as possible. Screen printing is often utilized for the metallization of ceramics. Using platinum/gold (Pt/Au) paste liquidus diffusion leads to a low adhesion strength of the Pt/Au pads after soldering. As an alternative, sputtering of thin film surface metallization was investigated. However, this alternative comes with a huge amount of different layer and parameter setups. In order to keep the amount of experiments and data acquisition in a reasonable magnitude, the Design of Experiment (DoE) evaluation displays a powerful tool. We found an optimal layer setup that maximizes the adhesion strength of the layer, while simultaneously minimizing the sheet resistance and removing the dependency of soldering time.

摘要

植入物及其制造的可靠性和可重复性高度依赖于组装和包装程序。诸如焊接等个人制造技能会引入不准确性,应尽可能避免。丝网印刷常用于陶瓷的金属化。使用铂/金(Pt/Au)糊剂进行液相扩散会导致焊接后Pt/Au焊盘的粘附强度较低。作为替代方案,研究了薄膜表面金属化的溅射工艺。然而,这种替代方案存在大量不同的层和参数设置。为了将实验和数据采集的数量保持在合理范围内,实验设计(DoE)评估是一个强大的工具。我们找到了一种最佳的层设置,该设置可使层的粘附强度最大化,同时最小化薄层电阻并消除对焊接时间的依赖性。

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