Chaudhary Prachi, Chhokar Vinod, Choudhary Pragati, Kumar Anil, Beniwal Vikas
Department of Biotechnology, Maharishi Markandeshwar University, Mullana, Ambala, 133207, India.
Department of Bio & Nano Technology, Guru Jambheshwar University of Science & Technology, Hisar, Haryana, 125001, India.
AMB Express. 2017 Nov 14;7(1):201. doi: 10.1186/s13568-017-0504-0.
A chromium and tannic acid resistance fungal strain was isolated from tannery effluent, and identified as Aspergillus niveus MCC 1318 based on its rDNA gene sequence. The MIC (minimum inhibitory concentration) of the isolate against chromium and tannic acid was found to be 200 ppm and 5% respectively. Optimization of physiochemical parameters for biosorption of chromium and tannic acid degradation was carried out by Plackett-Burman design followed by response surface methodology (RSM). The maximum chromium removal and tannic acid degradation was found to be 92 and 68% respectively by A. niveus. Chromium removal and tannic acid degradation was increased up to 11 and 6% respectively after optimization. Scanning electron microscopy (SEM) and Fourier transform infrared spectroscopy (FTIR) was used to investigate biosorption phenomena.
从制革厂废水中分离出一株耐铬和单宁酸的真菌菌株，根据其rDNA基因序列鉴定为雪白曲霉MCC 1318。该分离株对铬和单宁酸的最低抑菌浓度（MIC）分别为200 ppm和5%。采用Plackett-Burman设计和响应面法（RSM）对铬生物吸附和单宁酸降解的理化参数进行了优化。雪白曲霉对铬的最大去除率和单宁酸的最大降解率分别为92%和68%。优化后，铬的去除率和单宁酸的降解率分别提高了11%和6%。利用扫描电子显微镜（SEM）和傅里叶变换红外光谱（FTIR）研究了生物吸附现象。
