Institut de Ciència de Materials de Barcelona (ICMAB-CSIC), Campus UAB, Bellaterra, 08193, Barcelona, Spain.
Sci Rep. 2018 Jan 11;8(1):495. doi: 10.1038/s41598-017-18842-5.
Ferroelectric BaTiO films with large polarization have been integrated with Si(001) by pulsed laser deposition. High quality c-oriented epitaxial films are obtained in a substrate temperature range of about 300 °C wide. The deposition temperature critically affects the growth kinetics and thermodynamics balance, resulting on a high impact in the strain of the BaTiO polar axis, which can exceed 2% in films thicker than 100 nm. The ferroelectric polarization scales with the strain and therefore deposition temperature can be used as an efficient tool to tailor ferroelectric polarization. The developed strategy overcomes the main limitations of the conventional strain engineering methodologies based on substrate selection: it can be applied to films on specific substrates including Si(001) and perovskites, and it is not restricted to ultrathin films.
采用脉冲激光沉积法将具有大极化强度的铁电 BaTiO 薄膜与 Si(001)集成。在约 300°C 的宽基底温度范围内获得了高质量的 c 取向外延薄膜。沉积温度对生长动力学和热力学平衡有重要影响,这会对 BaTiO 极轴的应变产生很大的影响,在厚度超过 100nm 的薄膜中,应变可超过 2%。铁电极化与应变成正比,因此沉积温度可作为一种有效的铁电极化调控工具。所开发的策略克服了基于衬底选择的传统应变工程方法的主要限制:它可应用于包括 Si(001)和钙钛矿在内的特定衬底上的薄膜,并且不受限于超薄薄膜。