Toyota Technological Institute, Nagoya, 468-8511, Japan.
Department of Physics, The University of Tokyo, Bunkyo, Tokyo, 113-0033, Japan.
Sci Rep. 2018 Jan 15;8(1):776. doi: 10.1038/s41598-017-18794-w.
We have studied the magneto-optical spectra of ultrathin magnetic films deposited on Si substrates coated with an oxide layer (SiOx). We find that the Kerr rotation angle and the ellipticity of ~1 nm thick CoFeB thin films, almost transparent to visible light, show a strong dependence on the thickness of the SiOx layer. The Kerr signal from the 1 nm CoFeB thin film can be larger than that of ~100 nm thick CoFeB films for a given SiOx thickness and light wavelength. The enhancement of the Kerr signal occurs when optical interference takes place within the SiOx layer. Interestingly, under such resonance condition, the measured Kerr signal is in some cases larger than the estimation despite the good agreement of the measured and calculated reflection amplitude. We infer the discrepancy originates from interface states that are distinct from the bulk characteristics. These results show that optical interference effect can be utilized to study the magneto-optical properties of ultrathin films.
我们研究了沉积在涂有氧化层(SiOx)的 Si 衬底上的超薄磁性薄膜的磁光光谱。我们发现,对可见光几乎透明的约 1nm 厚 CoFeB 薄膜的克尔旋转角和椭圆率强烈依赖于 SiOx 层的厚度。对于给定的 SiOx 厚度和波长,来自 1nm CoFeB 薄膜的克尔信号可以大于约 100nm 厚 CoFeB 薄膜的克尔信号。当光学干涉发生在 SiOx 层内时,克尔信号会增强。有趣的是,在这种共振条件下,尽管测量的和计算的反射幅度吻合较好,但测量的克尔信号在某些情况下仍然大于估计值。我们推断这种差异源于与体特性不同的界面态。这些结果表明,光学干涉效应可用于研究超薄薄膜的磁光性质。