Li Yuanzheng, Li Xinshu, Yu Tong, Yang Guochun, Chen Heyu, Zhang Cen, Feng Qiushi, Ma Jiangang, Liu Weizhen, Xu Haiyang, Liu Yichun, Liu Xinfeng
Centre for Advanced Optoelectronic Functional Materials Research and Key Laboratory of UV-Emitting Materials and Technology (Northeast Normal University), Ministry of Education, Changchun 130024, People's Republic of China. Divison of Nanophotonics, CAS Key Laboratory of Standardization and Measurement for Nanotechnology, CAS Center for Excellence in Nanoscience, National Center for Nanoscience and Technology, Beijing 100190, People's Republic of China. University of Chinese Academy of Sciences 19 A Yuquan Rd, Shijingshan District, Beijing 100049, People's Republic of China.
Nanotechnology. 2018 Mar 23;29(12):124001. doi: 10.1088/1361-6528/aaa923.
Transition metal dichalcogenides (TMDs) with a typical layered structure are highly sensitive to their layer number in optical and electronic properties. Seeking a simple and effective method for layer number identification is very important to low-dimensional TMD samples. Herein, a rapid and accurate layer number identification of few-layer WS and WSe is proposed via locking their photoluminescence (PL) peak-positions. As the layer number of WS/WSe increases, it is found that indirect transition emission is more thickness-sensitive than direct transition emission, and the PL peak-position differences between the indirect and direct transitions can be regarded as fingerprints to identify their layer number. Theoretical calculation confirms that the notable thickness-sensitivity of indirect transition derives from the variations of electron density of states of W atom d-orbitals and chalcogen atom p-orbitals. Besides, the PL peak-position differences between the indirect and direct transitions are almost independent of different insulating substrates. This work not only proposes a new method for layer number identification via PL studies, but also provides a valuable insight into the thickness-dependent optical and electronic properties of W-based TMDs.
具有典型层状结构的过渡金属二硫属化物(TMDs)在光学和电学性质方面对其层数高度敏感。对于低维TMD样品而言,寻找一种简单有效的层数识别方法非常重要。在此,通过锁定其光致发光(PL)峰位置,提出了一种快速准确地识别少层WS和WSe层数的方法。随着WS/WSe层数的增加,发现间接跃迁发射比直接跃迁发射对厚度更敏感,并且间接跃迁和直接跃迁之间的PL峰位置差异可被视为识别其层数的指纹。理论计算证实,间接跃迁显著的厚度敏感性源于W原子d轨道和硫属原子p轨道的态电子密度变化。此外,间接跃迁和直接跃迁之间的PL峰位置差异几乎与不同的绝缘衬底无关。这项工作不仅通过PL研究提出了一种新的层数识别方法,还为基于W的TMDs厚度依赖的光学和电学性质提供了有价值的见解。