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从硅烯单层到Ag(111)上的薄硅膜的转变：实验数据与蒙特卡罗模拟的比较

Transition from silicene monolayer to thin Si films on Ag(111): comparison between experimental data and Monte Carlo simulation.

作者信息

Curcella Alberto, Bernard Romain, Borensztein Yves, Pandolfi Silvia, Prévot Geoffroy

机构信息

Sorbonne Universités, UPMC Univ Paris 06, CNRS-UMR 7588, Institut des NanoSciences de Paris, F-75005, Paris, France.

出版信息

Beilstein J Nanotechnol. 2018 Jan 5;9:48-56. doi: 10.3762/bjnano.9.7. eCollection 2018.

DOI:10.3762/bjnano.9.7
PMID:29379700
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC5769081/
Abstract

Scanning tunneling microscopy (STM), Auger electron spectroscopy (AES) and low energy electron diffraction have been used to follow the growth of Si films on Ag(111) at various temperatures. Using a simple growth model, we have simulated the distribution of film thickness as a function of coverage during evaporation, for the different temperatures. In the temperature regime where multilayer silicene has been claimed to form (470-500 K), a good agreement is found with AES intensity variations and STM measurements within a Ag surfactant mediated growth, whereas a model with multilayer silicene growth fails to reproduce the AES measurements.

摘要

扫描隧道显微镜（STM）、俄歇电子能谱（AES）和低能电子衍射已被用于跟踪不同温度下硅膜在Ag(111)上的生长情况。使用一个简单的生长模型，我们模拟了不同温度下蒸发过程中膜厚度随覆盖率的分布。在据称会形成多层硅烯的温度范围（470 - 500 K）内，发现与Ag表面活性剂介导生长过程中的AES强度变化和STM测量结果吻合良好，而多层硅烯生长模型无法重现AES测量结果。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/4619/5769081/b056bfbda440/Beilstein_J_Nanotechnol-09-48-g005.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/4619/5769081/01adc52dcfe8/Beilstein_J_Nanotechnol-09-48-g002.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/4619/5769081/43b1b899cd39/Beilstein_J_Nanotechnol-09-48-g003.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/4619/5769081/de56d0b67ade/Beilstein_J_Nanotechnol-09-48-g004.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/4619/5769081/b056bfbda440/Beilstein_J_Nanotechnol-09-48-g005.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/4619/5769081/01adc52dcfe8/Beilstein_J_Nanotechnol-09-48-g002.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/4619/5769081/43b1b899cd39/Beilstein_J_Nanotechnol-09-48-g003.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/4619/5769081/de56d0b67ade/Beilstein_J_Nanotechnol-09-48-g004.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/4619/5769081/b056bfbda440/Beilstein_J_Nanotechnol-09-48-g005.jpg

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Critical Au Concentration for the Stabilization of Au-Cu Nanoparticles on Rutile against Dissociation under Oxygen.
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