Department of Chemistry, University of California , Riverside, California 92521, United States.
Chemical Sciences Division and Center for Nanophase Materials Sciences, Oak Ridge National Laboratory , Oak Ridge, Tennessee 37831, United States.
ACS Appl Mater Interfaces. 2018 Feb 21;10(7):6694-6700. doi: 10.1021/acsami.7b17600. Epub 2018 Feb 12.
Two-dimensional atomically thin hexagonal boron nitride (h-BN) monolayers have attracted considerable research interest. Given the tremendous progress in the synthesis of h-BN monolayers on transition metals and their potential as electrocatalysts, we investigate the electrocatalytic activities of h-BN/Ni, h-BN/Co, and h-BN/Cu interfaces for CO reduction by the first-principles density functional theory. We find that with the h-BN monolayer on the metal, electrons transfer from the metal to the interface and accumulate under the B atoms. By calculating the binding energies of three key intermediates (H, HCOO, and COOH) for hydrogen evolution and CO reduction, we find that H binding on the metal can be significantly weakened by the h-BN monolayer, preventing the hydrogen evolution reaction (HER). However, the binding strength of HCOO is strong on both the metal and h-BN/metal, especially for Ni and Co, promoting the CO reduction channel. On the basis of the free-energy diagrams, we predict that h-BN/Ni and h-BN/Co will have very good electrocatalytic activities for CO reduction to HCOOH, while the competitive HER channel is filtered out by the surface h-BN monolayer. Our study opens a new way for selective electroreduction of CO via the interface engineering of the h-BN/metal system.
二维原子级薄的六方氮化硼 (h-BN) 单层吸引了相当多的研究兴趣。鉴于 h-BN 单层在过渡金属上的合成取得了巨大进展,以及它们作为电催化剂的潜力,我们通过第一性原理密度泛函理论研究了 h-BN/Ni、h-BN/Co 和 h-BN/Cu 界面对于 CO 还原的电催化活性。我们发现,在金属上存在 h-BN 单层时,电子从金属转移到界面并在 B 原子下方积累。通过计算析氢和 CO 还原的三个关键中间体 (H、HCOO 和 COOH) 的结合能,我们发现 h-BN 单层可以显著削弱金属上 H 的结合,从而阻止析氢反应 (HER)。然而,HCOO 在金属和 h-BN/金属上的结合强度都很强,特别是对于 Ni 和 Co,这促进了 CO 还原途径。基于自由能图,我们预测 h-BN/Ni 和 h-BN/Co 将对 CO 还原为 HCOOH 具有非常好的电催化活性,而竞争的 HER 途径被表面 h-BN 单层过滤掉。我们的研究为通过 h-BN/金属系统的界面工程选择性电还原 CO 开辟了一条新途径。