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nBn扩展短波长红外焦平面阵列。

nBn extended short-wavelength infrared focal plane array.

作者信息

Dehzangi Arash, Haddadi Abbas, Chevallier Romain, Zhang Yiyun, Razeghi Manijeh

出版信息

Opt Lett. 2018 Feb 1;43(3):591-594. doi: 10.1364/OL.43.000591.

Abstract

An extended short-wavelength nBn InAs/GaSb/AlSb type-II superlattice-based infrared focal plane array imager was demonstrated. A newly developed InAsSb/GaSb superlattice design was used as the large-bandgap electron barrier in this photodetector. The large band gap electron-barrier design in this nBn photodetector architecture leads to the device having lower dark current densities. A new bi-layer etch-stop scheme using a combination of InAsSb bulk and AlAsSb/GaSb superlattice layers was introduced to allow complete substrate removal and a shorter wavelength cut-on. Test pixels exhibit 100% cutoff wavelengths of ∼2.30 and ∼2.48  μm at 150 and 300 K, respectively. The devices achieve saturated quantum efficiency values of 59.7% and 63.8% at 150 and 300 K, respectively, under backside illumination and without any antireflection coating. At 150 K, photodetectors exhibit dark current density of 8.75×10  A/cm under -400  mV applied bias, providing specific detectivity of 2.82×10  cm·Hz/W at 1.78 μm. At 300 K, the dark current density reaches 4.75×10  A/cm under -200  mV bias, providing a specific detectivity of 8.55×10  cm·Hz/W 1.78 μm.

摘要

展示了一种基于扩展短波长nBn InAs/GaSb/AlSb II型超晶格的红外焦平面阵列成像器。一种新开发的InAsSb/GaSb超晶格设计被用作该光电探测器中的大带隙电子势垒。这种nBn光电探测器结构中的大带隙电子势垒设计导致器件具有更低的暗电流密度。引入了一种新的双层蚀刻停止方案,该方案使用InAsSb体层和AlAsSb/GaSb超晶格层的组合,以实现完全去除衬底并降低截止波长。测试像素在150 K和300 K时分别显示出约2.30和约2.48μm的100%截止波长。在背照且无任何抗反射涂层的情况下,这些器件在150 K和300 K时分别实现了59.7%和63.8%的饱和量子效率值。在150 K时,光电探测器在施加-400 mV偏压下的暗电流密度为8.75×10 A/cm,在1.78μm处的比探测率为2.82×10 cm·Hz/W。在300 K时,在-200 mV偏压下暗电流密度达到4.75×10 A/cm,在1.78μm处的比探测率为8.55×10 cm·Hz/W。

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