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用光镊驱动的硅纳米光机械装置上的卡西米尔和范德瓦尔斯力的严格分析。

Rigorous analysis of Casimir and van der Waals forces on a silicon nano-optomechanical device actuated by optical forces.

机构信息

Instituto Tecnológico de Aeronáutica, 50 Praça Marechal Eduardo Gomes, Vila das Acácias, São José dos Campos, SP 12228-900, Brazil.

出版信息

Nanoscale. 2018 Feb 22;10(8):3945-3952. doi: 10.1039/c7nr09318g.

Abstract

Nano-optomechanical devices have enabled a lot of interesting scientific and technological applications. However, due to their nanoscale dimensions, they are vulnerable to the action of Casimir and van der Waals (dispersion) forces. This work presents a rigorous analysis of the dispersion forces on a nano-optomechanical device based on a silicon waveguide and a silicon dioxide substrate, surrounded by air and driven by optical forces. The dispersion forces are calculated using a modified Lifshitz theory with experimental optical data and validated by means of a rigorous 3D FDTD simulation. The mechanical nonlinearity of the nanowaveguide is taken into account and validated using a 3D FEM simulation. The results show that it is possible to attain a no pull-in critical point due to only the optical forces; however, the dispersion forces usually impose a pull-in critical point to the device and establish a minimal initial gap between the waveguide and the substrate. Furthermore, it is shown that the geometric nonlinearity effect may be exploited in order to avoid or minimize the pull-in and, therefore, the device collapse.

摘要

纳米光学机械装置已经实现了许多有趣的科学和技术应用。然而,由于其纳米级尺寸,它们容易受到卡西米尔和范德瓦尔斯(色散)力的作用。这项工作基于硅波导和二氧化硅衬底,对周围为空气并受光学力驱动的纳米光学机械装置上的色散力进行了严格的分析。使用经过修正的包含实验光学数据的 Lifshitz 理论和严格的 3D FDTD 模拟对色散力进行了计算和验证。考虑到纳米波导的机械非线性,使用 3D FEM 模拟对其进行了验证。结果表明,仅通过光学力就有可能达到无拉入临界点;然而,色散力通常会对器件施加拉入临界点,并在波导和衬底之间建立最小的初始间隙。此外,还表明可以利用几何非线性效应来避免或最小化拉入,从而避免器件崩溃。

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