Zdora Marie-Christine, Zanette Irene, Zhou Tunhe, Koch Frieder J, Romell Jenny, Sala Simone, Last Arndt, Ohishi Yasuo, Hirao Naohisa, Rau Christoph, Thibault Pierre
Opt Express. 2018 Feb 19;26(4):4989-5004. doi: 10.1364/OE.26.004989.
The current advances in new generation X-ray sources are calling for the development and improvement of high-performance optics. Techniques for high-sensitivity phase sensing and wavefront characterisation, preferably performed at-wavelength, are increasingly required for quality control, optimisation and development of such devices. We here show that the recently proposed unified modulated pattern analysis (UMPA) can be used for these purposes. We characterised two polymer X-ray refractive lenses and quantified the effect of beam damage and shape errors on their refractive properties. Measurements were performed with two different setups for UMPA and validated with conventional X-ray grating interferometry. Due to its adaptability to different setups, the ease of implementation and cost-effectiveness, we expect UMPA to find applications for high-throughput quantitative optics characterisation and wavefront sensing.
新一代X射线源的当前进展正推动着高性能光学器件的开发与改进。对于此类器件的质量控制、优化和开发，越来越需要采用高灵敏度相位传感和波前表征技术，最好是在波长处进行。我们在此表明，最近提出的统一调制图案分析（UMPA）可用于这些目的。我们对两个聚合物X射线折射透镜进行了表征，并量化了光束损伤和形状误差对其折射特性的影响。使用两种不同的UMPA设置进行了测量，并用传统的X射线光栅干涉测量法进行了验证。由于其对不同设置的适应性、易于实施和成本效益，我们预计UMPA将在高通量定量光学表征和波前传感中得到应用。
