Suppr超能文献

剥离单层 MoS2 中的空穴输运

Hole Transport in Exfoliated Monolayer MoS.

出版信息

ACS Nano. 2018 Mar 27;12(3):2669-2676. doi: 10.1021/acsnano.7b08831. Epub 2018 Mar 1.

Abstract

Ideal monolayers of common semiconducting transition-metal dichalcogenides (TMDCs) such as MoS, WS, MoSe, and WSe possess many similar electronic properties. As it is the case for all semiconductors, however, the physical response of these systems is strongly determined by defects in a way specific to each individual compound. Here we investigate the ability of exfoliated monolayers of these TMDCs to support high-quality, well-balanced ambipolar conduction, which has been demonstrated for WS, MoSe, and WSe, but not for MoS. Using ionic-liquid gated transistors, we show that, contrary to WS, MoSe, and WSe, hole transport in exfoliated MoS monolayers is systematically anomalous, exhibiting a maximum in conductivity at negative gate voltage ( V ) followed by a suppression of up to 100 times upon further increasing V . To understand the origin of this difference, we have performed a series of experiments including the comparison of hole transport in MoS monolayers and thicker multilayers, in exfoliated and CVD-grown monolayers, as well as gate-dependent optical measurements (Raman and photoluminescence) and scanning tunneling imaging and spectroscopy. In agreement with existing ab initio calculations, the results of all these experiments are consistently explained in terms of defects associated with chalcogen vacancies that only in MoS monolayers, but not in thicker MoS multilayers nor in monolayers of the other common semiconducting TMDCs, create in-gap states near the top of the valence band that act as strong hole traps. Our results demonstrate the importance of studying systematically how defects determine the properties of 2D semiconducting materials and of developing methods to control them.

摘要

理想的常见半导体过渡金属二卤化物(TMDC)单层,如 MoS、WS、MoSe 和 WSe,具有许多相似的电子特性。然而,与所有半导体一样,这些系统的物理响应强烈取决于各化合物特有的缺陷。在这里,我们研究了这些 TMDC 剥离单层支持高质量、平衡双极性传导的能力,这种能力已经在 WS、MoSe 和 WSe 中得到了证明,但在 MoS 中没有。使用离子液体门控晶体管,我们表明,与 WS、MoSe 和 WSe 相反,剥离 MoS 单层中的空穴输运是系统异常的,在负栅压(V)下表现出电导率最大值,随后进一步增加 V 时电导率抑制高达 100 倍。为了理解这种差异的起源,我们进行了一系列实验,包括 MoS 单层和较厚多层、剥离和 CVD 生长单层中的空穴输运比较,以及栅极依赖的光学测量(拉曼和光致发光)和扫描隧道成像和光谱学。与现有的从头计算一致,所有这些实验的结果都一致地解释为与硫属元素空位相关的缺陷,这些缺陷仅在 MoS 单层中,而不在较厚的 MoS 多层中,也不在其他常见半导体 TMDC 的单层中,在价带顶部附近形成带隙态,作为强空穴陷阱。我们的结果表明,研究缺陷如何系统地决定 2D 半导体材料的性质以及开发控制它们的方法非常重要。

文献AI研究员

20分钟写一篇综述,助力文献阅读效率提升50倍。

立即体验

用中文搜PubMed

大模型驱动的PubMed中文搜索引擎

马上搜索

文档翻译

学术文献翻译模型,支持多种主流文档格式。

立即体验