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低暗电流宽带360 - 1650纳米铟锡氧化物/银/ n型硅肖特基光电探测器

Low dark current broadband 360-1650 nm ITO/Ag/n-Si Schottky photodetectors.

作者信息

Huang Zhiwei, Mao Yichen, Lin Guangyang, Yi Xiaohui, Chang Ailing, Li Cheng, Chen Songyan, Huang Wei, Wang Jianyuan

出版信息

Opt Express. 2018 Mar 5;26(5):5827-5834. doi: 10.1364/OE.26.005827.

Abstract

This work designed an ITO/Ag/n-Si Schottky photodetector with broad wavelength detection and low dark current. The introduction of Ag interfacial layer and post rapid thermal annealing dramatically increase the barrier height of ITO/n-Si Schottky diode by 0.32 eV, leading to the 2300 × reduction of dark current. A well-behaved ITO/Ag (8 nm)/n-Si Schottky diode with a high rectification ratio ( ± 1 V) of 4 × 10 and low dark current (-1 V) of 9.2 nA was achieved. Such low dark current device spontaneously provides high sensitivity for visible/near infrared wavelength detection, in which substantial responsivity for wavelengths from 360 to 1650 nm was realized through both inter-band and internal photoemission. The design here provides an encouraging strategy for monolithically integrated pure Si photodetectors operating at long wavelength up to 1650 nm.

摘要

这项工作设计了一种具有宽波长检测和低暗电流的ITO/Ag/n-Si肖特基光电探测器。Ag界面层的引入和快速热退火后处理极大地提高了ITO/n-Si肖特基二极管的势垒高度0.32 eV,导致暗电流降低了2300倍。实现了具有4×10的高整流比(±1 V)和9.2 nA的低暗电流(-1 V)的性能良好的ITO/Ag(8 nm)/n-Si肖特基二极管。这种低暗电流器件自然地为可见/近红外波长检测提供了高灵敏度,其中通过带间和内光电发射实现了对360至1650 nm波长的显著响应率。这里的设计为工作在高达1650 nm长波长的单片集成纯硅光电探测器提供了一种令人鼓舞的策略。

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