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亚带隙近红外波段的黑色硅肖特基光电探测器。

Black silicon Schottky photodetector in sub-bandgap near-infrared regime.

作者信息

Hu Fei, Dai Xi-Yuan, Zhou Zhi-Quan, Kong Xiang-Yang, Sun Shu-Lin, Zhang Rong-Jun, Wang Song-You, Lu Ming, Sun Jian

出版信息

Opt Express. 2019 Feb 4;27(3):3161-3168. doi: 10.1364/OE.27.003161.

Abstract

Sub-bandgap near-infrared silicon (Si) photodetectors are key elements in integrated Si photonics. We demonstrate such a Si photodetector based on a black Si (b-Si)/Ag nanoparticles (Ag-NPs) Schottky junction. This photodetector synergistically employs the mechanisms of inner photoemission, light-trapping, and surface-plasmon-enhanced absorption to efficiently absorb the sub-bandgap light and generate a photocurrent. The b-Si/Ag-NPs sample was prepared by means of wet chemical etching. Compared to those of a planar-Si/Ag thin-film Schottky photodetector, the responsivities of the b-Si/Ag-NPs photodetector were greatly enhanced, being 0.277 and 0.226 mA/W at a reversely biased voltage of 3 V for 1319- and 1550-nm light, respectively.

摘要

亚带隙近红外硅(Si)光电探测器是集成硅光子学中的关键元件。我们展示了一种基于黑硅(b-Si)/银纳米颗粒(Ag-NPs)肖特基结的硅光电探测器。该光电探测器协同利用内光电发射、光捕获和表面等离子体增强吸收机制,以有效吸收亚带隙光并产生光电流。b-Si/Ag-NPs样品通过湿化学蚀刻制备。与平面Si/Ag薄膜肖特基光电探测器相比,b-Si/Ag-NPs光电探测器的响应度大大提高,在3 V反向偏置电压下,对1319 nm和1550 nm光的响应度分别为0.277和0.226 mA/W。

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