• 文献检索
  • 文档翻译
  • 深度研究
  • 学术资讯
  • Suppr Zotero 插件Zotero 插件
  • 邀请有礼
  • 套餐&价格
  • 历史记录
应用&插件
Suppr Zotero 插件Zotero 插件浏览器插件Mac 客户端Windows 客户端微信小程序
定价
高级版会员购买积分包购买API积分包
服务
文献检索文档翻译深度研究API 文档MCP 服务
关于我们
关于 Suppr公司介绍联系我们用户协议隐私条款
关注我们

Suppr 超能文献

核心技术专利:CN118964589B侵权必究
粤ICP备2023148730 号-1Suppr @ 2026

文献检索

告别复杂PubMed语法,用中文像聊天一样搜索,搜遍4000万医学文献。AI智能推荐,让科研检索更轻松。

立即免费搜索

文件翻译

保留排版,准确专业,支持PDF/Word/PPT等文件格式,支持 12+语言互译。

免费翻译文档

深度研究

AI帮你快速写综述,25分钟生成高质量综述,智能提取关键信息,辅助科研写作。

立即免费体验

氧化铪忆阻器件中的丝状物生长和电阻开关。

Filament Growth and Resistive Switching in Hafnium Oxide Memristive Devices.

机构信息

Electrodynamics and Physical Electronics Group , Brandenburg University of Technology , 03046 Cottbus , Germany.

Institute of Theoretical Electrical Engineering , Ruhr University Bochum , 44780 Bochum , Germany.

出版信息

ACS Appl Mater Interfaces. 2018 May 2;10(17):14857-14868. doi: 10.1021/acsami.7b19836. Epub 2018 Apr 18.

DOI:10.1021/acsami.7b19836
PMID:29601180
Abstract

We report on the resistive switching in TiN/Ti/HfO/TiN memristive devices. A resistive switching model for the device is proposed, taking into account important experimental and theoretical findings. The proposed switching model is validated using 2D and 3D kinetic Monte Carlo simulation models. The models are consistently coupled to the electric field and different current transport mechanisms such as direct tunneling, trap-assisted tunneling, ohmic transport, and transport through a quantum point contact have been considered. We find that the numerical results are in excellent agreement with experimentally obtained data. Important device parameters, which are difficult or impossible to measure in experiments, are calculated. This includes the shape of the conductive filament, width of filament constriction, current density, and temperature distribution. To obtain insights in the operation of the device, consecutive cycles have been simulated. Furthermore, the switching kinetics for the forming and set process for different applied voltages is investigated. Finally, the influence of an annealing process on the filament growth, especially on the filament growth direction, is discussed.

摘要

我们报告了 TiN/Ti/HfO/TiN 忆阻器件中的电阻开关现象。提出了一个考虑到重要实验和理论发现的器件电阻开关模型。使用二维和三维动力学蒙特卡罗模拟模型验证了所提出的开关模型。这些模型与电场一致耦合,并考虑了不同的电流传输机制,如直接隧穿、陷阱辅助隧穿、欧姆传输和通过量子点接触的传输。我们发现数值结果与实验获得的数据非常吻合。计算了一些重要的器件参数,这些参数在实验中很难或不可能测量,包括导电丝的形状、丝缩窄的宽度、电流密度和温度分布。为了深入了解器件的工作原理,模拟了连续循环。此外,还研究了不同外加电压下的形成和置位过程的开关动力学。最后,讨论了退火过程对丝的生长,特别是丝的生长方向的影响。

相似文献

1
Filament Growth and Resistive Switching in Hafnium Oxide Memristive Devices.氧化铪忆阻器件中的丝状物生长和电阻开关。
ACS Appl Mater Interfaces. 2018 May 2;10(17):14857-14868. doi: 10.1021/acsami.7b19836. Epub 2018 Apr 18.
2
Investigation on the Conductive Filament Growth Dynamics in Resistive Switching Memory via a Universal Monte Carlo Simulator.通过通用蒙特卡罗模拟器研究电阻式开关存储器中的导电丝生长动力学。
Sci Rep. 2017 Sep 11;7(1):11204. doi: 10.1038/s41598-017-11165-5.
3
Roles of conducting filament and non-filament regions in the TaO and HfO resistive switching memory for switching reliability.在 TaO 和 HfO 电阻式随机存取存储器中,导丝区和非导丝区在开关可靠性方面的作用。
Nanoscale. 2017 May 11;9(18):6010-6019. doi: 10.1039/c7nr01243h.
4
Competitive effects of oxygen vacancy formation and interfacial oxidation on an ultra-thin HfO2-based resistive switching memory: beyond filament and charge hopping models.氧空位形成和界面氧化对基于超薄HfO₂的电阻开关存储器的竞争效应:超越丝状和电荷跳跃模型
Phys Chem Chem Phys. 2016 Apr 7;18(13):8820-6. doi: 10.1039/c6cp00916f.
5
Enhancement of Resistive Switching Performance in Hafnium Oxide (HfO) Devices via Sol-Gel Method Stacking Tri-Layer HfO/Al-ZnO/HfO Structures.通过溶胶-凝胶法堆叠三层HfO/Al-ZnO/HfO结构提高氧化铪(HfO)器件的电阻开关性能。
Nanomaterials (Basel). 2022 Dec 22;13(1):39. doi: 10.3390/nano13010039.
6
Bipolar Resistive Switching Characteristics of HfO/TiO/HfO Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition.通过原子层沉积法在铂和氮化钛涂层衬底上制备的HfO/TiO/HfO三层结构RRAM器件的双极电阻开关特性
Nanoscale Res Lett. 2017 Dec;12(1):393. doi: 10.1186/s11671-017-2164-z. Epub 2017 Jun 8.
7
Geometric conductive filament confinement by nanotips for resistive switching of HfO2-RRAM devices with high performance.用于高性能HfO2-RRAM器件电阻开关的纳米尖端对几何导电丝的限制
Sci Rep. 2016 May 16;6:25757. doi: 10.1038/srep25757.
8
Optimization of Bilayer Resistive Random Access Memory Based on Ti/HfO/ZrO/Pt.基于Ti/HfO/ZrO/Pt的双层电阻式随机存取存储器的优化
Materials (Basel). 2024 Apr 17;17(8):1852. doi: 10.3390/ma17081852.
9
The Role of Ti Buffer Layer Thickness on the Resistive Switching Properties of Hafnium Oxide-Based Resistive Switching Memories.钛缓冲层厚度对基于氧化铪的电阻式存储器件电阻开关性能的影响。
Langmuir. 2017 May 16;33(19):4654-4665. doi: 10.1021/acs.langmuir.7b00479. Epub 2017 May 1.
10
An Atomistic Model of Field-Induced Resistive Switching in Valence Change Memory.原子级模型揭示相变存储中电场诱导的电阻转变
ACS Nano. 2023 May 9;17(9):8281-8292. doi: 10.1021/acsnano.2c12575. Epub 2023 Mar 22.

引用本文的文献

1
Investigating the effect of electrical and thermal transport properties on oxide-based memristors performance and reliability.研究电学和热输运特性对氧化物基忆阻器性能和可靠性的影响。
Sci Rep. 2025 May 28;15(1):18646. doi: 10.1038/s41598-025-02909-9.
2
Identifying and understanding the nonlinear behavior of memristive devices.识别和理解忆阻器件的非线性行为。
Sci Rep. 2024 Dec 30;14(1):31633. doi: 10.1038/s41598-024-80568-y.
3
Role of oxygen vacancies in ferroelectric or resistive switching hafnium oxide.氧空位在铁电或电阻开关氧化铪中的作用。
Nano Converg. 2023 Dec 1;10(1):55. doi: 10.1186/s40580-023-00403-4.
4
TiN/Ti/HfO/TiN memristive devices for neuromorphic computing: from synaptic plasticity to stochastic resonance.用于神经形态计算的TiN/Ti/HfO/TiN忆阻器件:从突触可塑性到随机共振
Front Neurosci. 2023 Sep 19;17:1271956. doi: 10.3389/fnins.2023.1271956. eCollection 2023.
5
Multi-level resistive switching in hafnium-oxide-based devices for neuromorphic computing.用于神经形态计算的基于氧化铪器件的多级电阻开关
Nano Converg. 2023 Sep 14;10(1):44. doi: 10.1186/s40580-023-00392-4.
6
Metal-Induced Trap States: The Roles of Interface and Border Traps in HfO/InGaAs.金属诱导陷阱态:HfO/InGaAs中界面陷阱和边界陷阱的作用
Micromachines (Basel). 2023 Aug 15;14(8):1606. doi: 10.3390/mi14081606.
7
Unravelling the Data Retention Mechanisms under Thermal Stress on 2D Memristors.揭示二维忆阻器热应力下的数据存储机制
ACS Omega. 2023 Jul 20;8(30):27543-27552. doi: 10.1021/acsomega.3c03200. eCollection 2023 Aug 1.
8
Thin-film design of amorphous hafnium oxide nanocomposites enabling strong interfacial resistive switching uniformity.非晶态氧化铪纳米复合材料的薄膜设计实现了强界面电阻开关均匀性。
Sci Adv. 2023 Jun 23;9(25):eadg1946. doi: 10.1126/sciadv.adg1946. Epub 2023 Jun 21.
9
Holistic Variability Analysis in Resistive Switching Memories Using a Two-Dimensional Variability Coefficient.使用二维变异系数进行阻变存储器的整体变异性分析。
ACS Appl Mater Interfaces. 2023 Apr 19;15(15):19102-19110. doi: 10.1021/acsami.2c22617. Epub 2023 Apr 7.
10
Crystal and Electronic Structure of Oxygen Vacancy Stabilized Rhombohedral Hafnium Oxide.氧空位稳定的菱面体氧化铪的晶体结构与电子结构
ACS Appl Electron Mater. 2023 Jan 26;5(2):754-763. doi: 10.1021/acsaelm.2c01255. eCollection 2023 Feb 28.