Meng Caixia, Li Yifan, Wu Hao, Wei Wei, Ning Yanxiao, Cui Yi, Fu Qiang, Bao Xinhe
State Key Laboratory of Catalysis, Dalian Institute of Chemical Physics, Chinese Academy of Sciences, Dalian 116023, China.
Phys Chem Chem Phys. 2018 Apr 25;20(16):11013-11020. doi: 10.1039/c8cp00877a.
Interaction of hexagonal boron nitride (h-BN) with gases is of great importance for its properties and applications. In the present work, the structural changes of h-BN overlayers on Pt(111) in oxidative atmospheres including O2 and NO2 have been investigated by using low energy electron microscopy, Auger electron spectroscopy, X-ray photoelectron spectroscopy (XPS), and near ambient pressure XPS. We find that h-BN islands can be intercalated by oxygen in 10-6 Torr O2 at 200 °C, while oxygen intercalation of full layer h-BN around 200 °C requires near ambient pressure O2 (0.1 Torr) or such a strong oxidant as NO2 (10-6 Torr). h-BN overlayers can be etched away in the gases at much high temperatures, e.g. 800 °C. Upon mild oxidation in O2 or NO2 at temperatures of 400-450 °C, h-BN is transformed to boron oxide (BOx) overlayers, which can be converted back to h-BN by heating in NH3 at 800 °C.
六方氮化硼（h-BN）与气体的相互作用对其性能和应用至关重要。在本工作中，利用低能电子显微镜、俄歇电子能谱、X射线光电子能谱（XPS）和近常压XPS研究了Pt(111)上h-BN覆盖层在包括O₂和NO₂在内的氧化气氛中的结构变化。我们发现，在200℃、10⁻⁶托的O₂中，h-BN岛会被氧插入，而在200℃左右，完整层h-BN的氧插入需要近常压的O₂（0.1托）或像NO₂（10⁻⁶托）这样的强氧化剂。h-BN覆盖层在高温（如800℃）的气体中会被蚀刻掉。在400 - 450℃的温度下于O₂或NO₂中进行温和氧化时，h-BN会转变为氧化硼（BOₓ）覆盖层，通过在800℃的NH₃中加热可将其再转变回h-BN。
