钌二硫烯配合物/聚硅氧烷薄膜的制备及其对 CO 气体的响应。
Preparation of Ruthenium Dithiolene Complex/Polysiloxane Films and Their Responses to CO Gas.
机构信息
Advanced Materials Laboratory, Advanced Automotive Research Collaborative Laboratory, Graduate School of Engineering, Hiroshima University, 1-4-1 Kagamiyama, Higashi-Hiroshima, Hiroshima 739-8527, Japan.
Department of Pure and Applied Chemistry, Faculty of Science and Technology, Tokyo University of Science, 2641 Yamazaki, Noda, Chiba 278-8510, Japan.
出版信息
Molecules. 2018 Apr 7;23(4):845. doi: 10.3390/molecules23040845.
To develop advanced materials using metal complexes, it is better to prepare metal complexes contained in composite or hybrid films. To achieve this purpose, we synthesized ruthenium complexes with dihalogen-substituted benzendithiolate ligands, [(η⁶-C₆Me₆)Ru(S₂C₆H₂X₂)] (X = F, 3,6-Cl, Br, 4,5-Cl), -. We also investigated preparation of or containing polysiloxane composite films and their reactivity to CO gas. All ruthenium complexes - reacted with CO gas, and carbonyl ligand adducts - were generated. Ruthenium complexes - show two strong absorption peaks around 550 and 420 nm. After exposure to CO gas, these absorption peaks were immediately decreased without a peak shift. A similar trend was observed in or containing polysiloxane composite films. These results indicate that and were easily converted into and , both in the solution and the polysiloxane film during CO gas exposure.
为了利用金属配合物开发先进材料，最好制备包含在复合或混合薄膜中的金属配合物。为此，我们合成了带有二卤代苯并二硫醇配体的钌配合物，[(η⁶-C₆Me₆)Ru(S₂C₆H₂X₂)] (X = F, 3,6-Cl, Br, 4,5-Cl)，-。我们还研究了含有聚硅氧烷复合材料薄膜的制备及其对 CO 气体的反应性。所有钌配合物-都与 CO 气体反应，生成羰基配体加合物-。钌配合物-在 550nm 和 420nm 左右显示出两个强吸收峰。暴露于 CO 气体后，这些吸收峰立即减少而没有峰位移。在含有聚硅氧烷复合材料薄膜的-或-中观察到类似的趋势。这些结果表明，在 CO 气体暴露期间，无论是在溶液中还是在聚硅氧烷薄膜中，-和-都很容易转化为-和-。
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