Department of Applied Physics, Graduate School of Engineering, Osaka City University, 3-3-138, Sugimoto, Sumiyoshi-ku, Osaka 558-8585, Japan.
Phys Chem Chem Phys. 2018 May 3;20(17):11954-11958. doi: 10.1039/c7cp07812a.
We investigated the effects of surface modification on the defect-related photoluminescence (PL) band in colloidal CdS quantum dots (QDs). A size-selective photoetching process and a surface modification technique with a Cd(OH)2 layer enabled the preparation of size-controlled CdS QDs with high PL efficiency. The Stokes shift of the defect-related PL band before and after the surface modification was ∼1.0 eV and ∼0.63 eV, respectively. This difference in the Stokes shifts suggests that the origin of the defect-related PL band was changed by the surface modification. Analysis by X-ray photoelectron spectroscopy revealed that the surface of the CdS QDs before and after the surface modification was S rich and Cd rich, respectively. These results suggest that Cd-vacancy acceptors and S-vacancy donors affect PL processes in CdS QDs before and after the surface modification, respectively.
我们研究了表面修饰对胶体 CdS 量子点(QDs)中与缺陷相关的光致发光(PL)带的影响。通过尺寸选择性光蚀刻工艺和 Cd(OH)2 层的表面修饰技术,制备了具有高光致发光效率的尺寸可控 CdS QDs。表面修饰前后与缺陷相关的 PL 带的斯托克斯位移分别约为 1.0 eV 和 0.63 eV。这种斯托克斯位移的差异表明,表面修饰改变了与缺陷相关的 PL 带的起源。X 射线光电子能谱分析表明,表面修饰前后 CdS QDs 的表面分别为 S 富和 Cd 富。这些结果表明,Cd 空位受体和 S 空位施主分别影响表面修饰前后 CdS QDs 的 PL 过程。