Yamada Itsunari, Ikeda Yusuke, Higuchi Tetsuya
Department of Electrical and Electronic Engineering, Faculty of Science and Engineering, Setsunan University, 17-8 Ikeda-Nakamachi, Neyagawa, Osaka 572-8508, Japan.
Department of Electronic Systems Engineering, School of Engineering, The University of Shiga Prefecture, 2500, Hassaka-cho, Hikone, Shiga 522-8533, Japan.
Rev Sci Instrum. 2018 May;89(5):053110. doi: 10.1063/1.4995449.
We fabricated a deformable transmission silicone [poly(dimethylsiloxane)] grating using a two-beam interference method and imprint lithography and evaluated its optical characteristics during a compression process. The grating pattern with 0.43 μm depth and 1.0 μm pitch was created on a silicone surface by an imprinting process with a photoresist mold to realize a simple, low-cost fabrication process. The first-order diffraction transmittance of this grating reached 10.3% at 632.8 nm wavelength. We also measured the relationship between the grating period and compressive stress to the fabricated elements. The grating period changed from 1.0 μm to 0.84 μm by 16.6% compression of the fabricated element in one direction, perpendicular to the grooves, and the first-order diffraction transmittance was 8.6%.
我们采用双光束干涉法和压印光刻技术制作了一种可变形的透射硅酮[聚（二甲基硅氧烷）]光栅，并在压缩过程中评估了其光学特性。通过使用光刻胶模具进行压印工艺，在硅酮表面形成了深度为0.43μm、间距为1.0μm的光栅图案，以实现简单、低成本的制造工艺。该光栅在632.8nm波长下的一级衍射透射率达到10.3%。我们还测量了所制备元件的光栅周期与压缩应力之间的关系。在所制备的元件沿垂直于凹槽的一个方向进行16.6%的压缩时，光栅周期从1.0μm变为0.84μm，此时一级衍射透射率为8.6%。
