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通过共形沉积和表面氟化蚀刻增强有机硅薄膜的表面疏水性和疏油性

Enhancement on the Surface Hydrophobicity and Oleophobicity of an Organosilicon Film by Conformity Deposition and Surface Fluorination Etching.

作者信息

Xu Zheng-Wen, Zhang Yu-Kai, Chen Tai-Hong, Chang Jin-How, Lee Tsung-Hsin, Li Pei-Yu, Liu Day-Shan

机构信息

Institute of Electro-Optical and Material Science, National Formosa University, 63201 Yunlin, Taiwan.

Additive Manufacturing and Laser Application, Industrial Technology Research Institute, 73445 Tainan, Taiwan.

出版信息

Materials (Basel). 2018 Jun 26;11(7):1089. doi: 10.3390/ma11071089.

Abstract

In this work, the surface morphology of a hydrophobic organosilicon film was modified as it was deposited onto a silver seed layer with nanoparticles. The surface hydrophobicity evaluated by the water contact angle was significantly increased from 100° to 128° originating from the surface of the organosilicon film becoming roughened, and was deeply relevant to the Ag seed layer conform deposition. In addition, the organosilicon film became surface oleophobic and the surface hydrophobicity was improved due to the formation of the inactive C-F chemical on the surface after the carbon tetrafluoride glow discharge etching. The surface hydrophobicity and oleophobicity of the organosilicon film could be further optimized with water and oleic contact angles of about 138° and 61°, respectively, after an adequate fluorination etching.

摘要

在这项工作中,一种疏水性有机硅薄膜在沉积到带有纳米颗粒的银种子层上时,其表面形态发生了改变。通过水接触角评估的表面疏水性从100°显著增加到128°,这源于有机硅薄膜表面变得粗糙,并且与银种子层的共形沉积密切相关。此外,在四氟化碳辉光放电蚀刻后,由于表面形成了惰性的C-F化学键,有机硅薄膜变得表面疏油且表面疏水性得到改善。经过适当的氟化蚀刻后,有机硅薄膜的表面疏水性和疏油性可以进一步优化,水接触角和油接触角分别约为138°和61°。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/4ace/6073231/198172cd6682/materials-11-01089-g001.jpg

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