School of Chemistry and Chemical Engineering, Southwest Petroleum University, Chengdu, 610500, China.
Phys Chem Chem Phys. 2018 Jul 18;20(28):19208-19220. doi: 10.1039/c8cp03552k.
The interfacial adsorption and interaction of crystal violet (CV) at the silica-water interface was real-time measured based on a total-internal-reflection-induced near-field evanescent wave (TIR-NFEW). A silica optical fiber (SOF) was employed as a charged substrate for CV adsorption and as a light transmission waveguide for evanescent wave production for the investigation system. According to the change of evanescent wave intensity, the CV adsorption behavior could be real-time monitored at the silica-aqueous interface. The Langmuir adsorption model and two kinetic models were applied to obtain the related thermodynamic and kinetic data, including the adsorption equilibrium constant (Kads) of (5.9 ± 1.5) × 104 M-1 and adsorption free energy (ΔG) of -21.6 ± 0.6 kJ mol-1. Meanwhile, this method was shown to be able to isolate the elementary processes of adsorption and desorption under steady-state conditions, and gave an adsorption rate constant (ka) and desorption rate constant (kd) of 2089 ± 6.96 M min-1 and 0.35 ± 0.0012 min-1 for a 15 rpm flow rate. The surface interaction process was revealed and the adsorption mechanism proposed by a molecular orientation adsorption model with three-stage-concentration, indicating that CV first adsorbed on Si-O- sites through electrostatic attraction, then on Si-OH sites through hydrogen bonding, and lastly on the surface through van der Waals forces with different CV concentrations. This study can provide a molecular-level interpretation of CV adsorption and provides important insights into how CV adsorption can be controlled at the silica-water interface.
基于全内反射诱导的近场消逝波(TIR-NFEW),实时测量了结晶紫(CV)在二氧化硅-水界面的界面吸附和相互作用。采用石英光纤(SOF)作为带电荷的 CV 吸附基底和消逝波光产生的光传输波导,用于研究系统。根据消逝波光强度的变化,可以实时监测 CV 在二氧化硅-水界面的吸附行为。应用 Langmuir 吸附模型和两个动力学模型,获得了相关的热力学和动力学数据,包括吸附平衡常数(Kads)为(5.9 ± 1.5)×104 M-1和吸附自由能(ΔG)为-21.6 ± 0.6 kJ mol-1。同时,该方法被证明能够在稳态条件下分离吸附和解吸的基本过程,并给出了在 15 rpm 流速下的吸附速率常数(ka)和脱附速率常数(kd)分别为 2089 ± 6.96 M min-1和 0.35 ± 0.0012 min-1。通过三阶段浓度的分子取向吸附模型揭示了表面相互作用过程,并提出了吸附机制,表明 CV 首先通过静电吸引吸附在 Si-O-位上,然后通过氢键吸附在 Si-OH 位上,最后在不同 CV 浓度下通过范德华力吸附在表面上。本研究可以为 CV 吸附提供分子水平的解释,并为如何控制 CV 在二氧化硅-水界面的吸附提供重要的见解。