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在 CVD 工艺中,掺氮单壁碳纳米管的原料依赖性氮构型。

Feedstock-dependent nitrogen configurations of nitrogen-doped single-walled carbon nanotubes in a CVD process.

机构信息

Program in Applied Physics, Maejo University, Chiang Mai, 50290, Thailand.

出版信息

Nanoscale. 2018 Aug 2;10(30):14579-14585. doi: 10.1039/c8nr02850h.

DOI:10.1039/c8nr02850h
PMID:30027966
Abstract

The modification of nitrogen configurations is a viable way to control the electronic properties of nitrogen-doped single-walled carbon nanotubes (N-doped SWCNTs). N-doped SWCNTs were synthesized by a conventional chemical vapor deposition process with a mixed carbon/nitrogen (C/N) feedstock. While higher feedstock flow rates promote the formation of encapsulated N2 molecules, lower flow rates show a predominance of pyridinic and graphitic nitrogen structures as revealed by X-ray photoemission spectroscopy. Therefore, the nitrogen doping in the sp2 carbon network can be controlled by the flow rate of the C/N feedstock.

摘要

氮构型的修饰是控制掺氮单壁碳纳米管(N-doped SWCNTs)电子性质的一种可行方法。N-doped SWCNTs 是通过传统的化学气相沉积工艺用混合碳/氮(C/N)原料合成的。虽然较高的原料流速有利于封装 N2 分子的形成,但较低的流速表明 X 射线光电子能谱显示出优先存在的吡啶型和石墨型氮结构。因此,氮在 sp2 碳网络中的掺杂可以通过 C/N 原料的流速来控制。

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