Kim Jae-Gyeong, Lee Ji-Eun, Jo Sung Min, Chin Byung Doo, Baek Ju-Yeoul, Ahn Kyung-Jun, Kang Seong Jun, Kim Han-Ki
School of Advanced Materials Science and Engineering, Sungkyunkwan University, 2066 Seobu-ro, Jangan-gu, Suwon, Gyeonggi-do, 16419, Republic of Korea.
Department of Polymer Science and Engineering, Dankook University, 152 Jukjeon-ro, Suji-gu, Yongin-si, Gyeonggi-do, 16890, Republic of Korea.
Sci Rep. 2018 Aug 13;8(1):12019. doi: 10.1038/s41598-018-30548-w.
We fabricated W-doped InO (IWO) films at room temperature on a flexible PET substrate using an in-line arc plasma ion plating system for application as flexible transparent conducting electrodes (FTCEs) in flexible organic light emitting diodes (OLEDs) and quantum dots light emitting diodes (QDLEDs). Due to the high-energy flux of the sublimated ions generated from the plasma region, the IWO films showed a well-developed crystalline structure with a low sheet resistance of 36.39 Ohm/square and an optical transmittance of 94.6% even though they were prepared at room temperature. The low sheet resistance of the IWO film processed at room temperature is attributed to the high mobility (59 cm/V-s) in the well-developed crystalline structure of the ion-plated IWO film and screening effect of W dopants. In addition, the better adhesion of the ion-plated IWO film on the PET substrate led to small critical outer and inner bending radii of 6 and 3 mm, respectively, against substrate bending. Due to the low sheet resistance, high optical transmittance, better crystallinity, better adhesion, and outstanding flexibility of the ion-plated IWO films, the flexible OLEDs and QDLEDs with the IWO electrodes showed better performances than flexible OLEDs and QDLEDs with sputtered flexible ITO anodes. This indicates that in-line arc plasma ion plating is a promising large area coating technique to realize room temperature processed high-quality FTCEs for flexible OLEDs and QDLEDs.
我们使用在线电弧等离子体离子镀系统在室温下于柔性聚对苯二甲酸乙二酯(PET)衬底上制备了掺钨氧化铟(IWO)薄膜,以用作柔性有机发光二极管(OLED)和量子点发光二极管(QDLED)中的柔性透明导电电极(FTCE)。由于等离子体区域产生的升华离子具有高能量通量,IWO薄膜呈现出发育良好的晶体结构,即使在室温下制备,其方阻仍低至36.39欧姆/平方,光学透过率为94.6%。室温下制备的IWO薄膜方阻低,归因于离子镀IWO薄膜发育良好的晶体结构中高迁移率(59 cm²/V·s)以及钨掺杂剂的屏蔽效应。此外,离子镀IWO薄膜在PET衬底上具有更好的附着力,使得在衬底弯曲时,其临界外弯曲半径和内弯曲半径分别小至6毫米和3毫米。由于离子镀IWO薄膜具有低方阻、高光学透过率、更好的结晶度、更好的附着力以及出色的柔韧性,带有IWO电极的柔性OLED和QDLED表现优于带有溅射柔性ITO阳极的柔性OLED和QDLED。这表明在线电弧等离子体离子镀是一种很有前景的大面积镀膜技术,可实现用于柔性OLED和QDLED的室温处理高质量FTCE。