Kliemt K, Bolte M, Krellner C
Physikalisches Institut, Goethe-Universität Frankfurt/M, 60438 Frankfurt/M, Germany.
J Phys Condens Matter. 2018 Sep 26;30(38):385801. doi: 10.1088/1361-648X/aada97. Epub 2018 Aug 16.
Single crystals of HoIrSi with the body-centered ThCrSi-type structure (I4/mmm) were grown by Bridgman method from indium flux. Single crystal structure determination yielded a Si-z position of 0.378(1) in the structure. We excluded the presence of the high temperature phase with the primitive CaBeGe-type structure (P4/nmm) by powder x-ray diffraction. Magnetic measurements on the single crystals yield a Néel temperature of [Formula: see text] K. In the inverse magnetic susceptibility a strong anisotropy with Weiss temperatures [Formula: see text] K and [Formula: see text] K occurs above T . The effective magnetic moment [Formula: see text] and [Formula: see text] is close to the expected value for a free Ho ion, [Formula: see text]. The field dependent magnetization shows a step-like behaviour due to crystalline electric field effects. The temperature and field dependence of the magnetization hint to the ordering of the magnetic moments along the c direction below T .
采用布里奇曼法从铟熔剂中生长出具有体心ThCrSi型结构(I4/mmm)的HoIrSi单晶。单晶结构测定得出该结构中Si的z位置为0.378(1)。通过粉末X射线衍射排除了具有原始CaBeGe型结构(P4/nmm)的高温相的存在。对单晶进行的磁性测量得出奈尔温度为[公式:见原文]K。在反磁导率中,高于T时出现了具有魏斯温度[公式:见原文]K和[公式:见原文]K的强各向异性。有效磁矩[公式:见原文]和[公式:见原文]接近自由Ho离子的预期值[公式:见原文]。由于晶体电场效应,场依赖磁化强度呈现出阶梯状行为。磁化强度的温度和场依赖性表明在T以下磁矩沿c方向有序排列。