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铍补偿掺杂InGaAs/GaAsSb II型超晶格光电二极管中深能级缺陷的研究。

Investigation of deep level defects on Beryllium compensation doping of InGaAs/GaAsSb type-II superlattice photodiodes.

作者信息

Li Jinlan, Xu Zhicheng, Han Ping, Chen Jianxin, Ji Xiaoli

出版信息

Opt Express. 2018 Jun 11;26(12):15308-15315. doi: 10.1364/OE.26.015308.

Abstract

In this paper, deep level transient spectroscopy (DLTS) characterization was performed on Beryllium compensation doping of InGaAs/GaAsSb type-II superlattice photodiode. Three electron traps with the energy levels located at E-0.11 eV (E1), E-0.28 eV (E2), E-0.17 eV (E3), and a hole trap situated at E + 0.25 eV (H1) were revealed. The position distribution and depth concentration of these traps in SL absorption region was also explored. Furthermore, the bandlike states (E2) and localized states (E1 and H1) of extended defects were confirmed by DLTS measurements as a function of the filling-pulse time, these traps as generation-recombination centers are responsible for dominant dark current.

摘要

本文对铍补偿掺杂的InGaAs/GaAsSb II型超晶格光电二极管进行了深能级瞬态谱(DLTS)表征。揭示了三个能级位于E - 0.11 eV(E1)、E - 0.28 eV(E2)、E - 0.17 eV(E3)的电子陷阱以及一个位于E + 0.25 eV(H1)的空穴陷阱。还研究了这些陷阱在超晶格吸收区的位置分布和深度浓度。此外,通过DLTS测量作为填充脉冲时间的函数,证实了扩展缺陷的带状态(E2)和局域态(E1和H1),这些作为产生 - 复合中心的陷阱是主导暗电流的原因。

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