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用于明亮垂直发光二极管的在(-201)β-GaO上生长的InGaN/GaN多量子阱的载流子动力学

Carrier dynamics of InGaN/GaN multiple quantum wells grown on (-201) β-GaO for bright vertical light emitting diodes.

作者信息

Muhammed Mufasila Mumthaz, Xu Jian, Wehbe Nimer, Roqan Iman Salem

出版信息

Opt Express. 2018 Jun 11;26(12):14869-14878. doi: 10.1364/OE.26.014869.

Abstract

High-quality InGaN/GaN multi-quantum well (MQW) structures (0.05≤x≤0.13), are successfully grown on transparent and conductive (-201)-oriented β-GaO substrate. Scanning-transmission electron microscopy and secondary ion mass spectrometry (SIMS) show well-defined high quality MQWs, while the In and Ga compositions in the wells and the barriers are estimated by SIMS. Temperature-dependant Photoluminescence (PL) confirms high optical quality with a strong bandedge emission and negligble yellow band. time-resolved PL measurements (via above/below-GaN bandgap excitations) explain carrier dynamics, showing that the radiative recombination is predominant. Our results demonstrate that (-201)-oriented β-GaO is a strong candidate as a substrate for III-nitride-based vertical- emitting devices.

摘要

高质量的氮化铟镓/氮化镓多量子阱(MQW)结构(0.05≤x≤0.13)成功生长在透明导电的(-201)取向β-GaO衬底上。扫描透射电子显微镜和二次离子质谱(SIMS)显示出定义明确的高质量多量子阱,同时通过SIMS估算阱和势垒中的铟和镓成分。温度相关光致发光(PL)证实了具有强带边发射和可忽略的黄带的高光学质量。时间分辨PL测量(通过氮化镓带隙以上/以下激发)解释了载流子动力学,表明辐射复合占主导。我们的结果表明,(-201)取向的β-GaO是基于III族氮化物的垂直发射器件衬底的有力候选者。

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