Peng Liyuan, Zhao Degang, Jiang Desheng, Zhu Jianjun, Liu Zongshun, Chen Ping, Yang Jing, Liu Wei, Liang Feng, Xing Yao, Liu Shuangtao, Zhang Liqun, Wang Wenjie, Li Mo, Zhang Yuantao, Du Guotong
Opt Express. 2018 Aug 20;26(17):21736-21744. doi: 10.1364/OE.26.021736.
Twelve InGaN MQW LED samples with varying well thickness grown via metal-organic chemical vaper deposition (MOCVD) are investigated. It is observed from electroluminescence (EL) measurement that at low current densities, the peak energy shifts to blue with increasing current, and when the current change by fixed increment, the peak energy shifts to blue end to different extent among samples. This blue shift was expected to be stronger when the well thickness increases, however, for well widths above 5 nm we observe a decrease in emission energy. Since no relaxation was detected from reciprocal space mapping (RSM), the deteriorated homogeneity is found to be responsible for this phenomenon. Temperature dependent photoluminescence (TDPL) results analyzed by band-tail model fitting show that the localization effect gets more prominent with increasing well thickness. It is found that elevating the growth temperature of active region from 710°C to 750°C significantly improves the homogeneity of InGaN layer.
研究了通过金属有机化学气相沉积(MOCVD)生长的12个阱厚度不同的InGaN多量子阱发光二极管(MQW LED)样品。从电致发光(EL)测量中观察到,在低电流密度下,峰值能量随着电流增加向蓝光方向移动,并且当电流以固定增量变化时,不同样品间峰值能量向蓝光端移动的程度不同。当阱厚度增加时,预计这种蓝移会更强,然而,对于阱宽度大于5 nm的情况,我们观察到发射能量降低。由于在倒易空间映射(RSM)中未检测到弛豫,发现均匀性变差是导致这种现象的原因。通过带尾模型拟合分析的温度相关光致发光(TDPL)结果表明,随着阱厚度增加,局域化效应变得更加显著。发现将有源区的生长温度从710°C提高到750°C可显著改善InGaN层的均匀性。