Wang Xiaowei, Liang Feng, Zhao Degang, Liu Zongshun, Zhu Jianjun, Yang Jing
State Key Laboratory of Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, Beijing, 100083, China.
College of Materials Science and Opto-Electronic Technology, University of Chinese Academy of Sciences, Beijing, 100049, China.
Nanoscale Res Lett. 2020 Oct 1;15(1):191. doi: 10.1186/s11671-020-03420-y.
Three InGaN/GaN MQWs samples with varying GaN cap layer thickness were grown by metalorganic chemical vapor deposition (MOCVD) to investigate the optical properties. We found that a thicker cap layer is more effective in preventing the evaporation of the In composition in the InGaN quantum well layer. Furthermore, the quantum-confined Stark effect (QCSE) is enhanced with increasing the thickness of GaN cap layer. In addition, compared with the electroluminescence measurement results, we focus on the difference of localization states and defects in three samples induced by various cap thickness to explain the anomalies in room temperature photoluminescence measurements. We found that too thin GaN cap layer will exacerbates the inhomogeneity of localization states in InGaN QW layer, and too thick GaN cap layer will generate more defects in GaN cap layer.
通过金属有机化学气相沉积(MOCVD)生长了三个具有不同GaN帽层厚度的InGaN/GaN多量子阱(MQW)样品,以研究其光学性质。我们发现,较厚的帽层在防止InGaN量子阱层中In组分蒸发方面更有效。此外,随着GaN帽层厚度的增加,量子限制斯塔克效应(QCSE)增强。另外,与电致发光测量结果相比,我们关注不同帽层厚度在三个样品中引起的局域态和缺陷的差异,以解释室温光致发光测量中的异常现象。我们发现,过薄的GaN帽层会加剧InGaN量子阱层中局域态的不均匀性,而过厚的GaN帽层会在GaN帽层中产生更多缺陷。