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在电子束辐照期间通过引入氩气去除环境透射电子显微镜中的碳污染。

Removal of carbon contamination in ETEM by introducing Ar during electron beam irradiation.

作者信息

Tokunaga T, Saito K, Kuno K, Higuchi K, Yamamoto Y, Yamamoto T

机构信息

Department of Quantum Engineering, Nagoya University, Furo-cho, chikusa-ku, Nagoya, Aichi, Japan.

Department of Material Engineering, Nagoya University, Furo-cho, chikusa-ku, Nagoya, Aichi, Japan.

出版信息

J Microsc. 2019 Jan;273(1):46-52. doi: 10.1111/jmi.12759. Epub 2018 Sep 25.

Abstract

Organic materials, including carbon, exist inside the transmission electron microscope (TEM) chamber and are adsorbed onto samples under observation during TEM. When these adsorbed organic materials are irradiated by an electron beam, the adsorbed gas is decomposed. Carbon atoms remain on the sample and bond with each other forming a material with an amorphous structure. Due to the carbon deposition on the observation area of the sample, it is contaminated and the TEM image quality is decreased. Ar was introduced into environmental TEM (ETEM) to purge organic material from the sample chamber to reduce contamination growth. After Ar gas was introduced, the contamination was gradually removed. The contamination removal rate was dependent on the Ar pressure. Moreover, it was clear that Ar was ionised by electron beam irradiation and the Ar ions were produced in the ETEM during electron beam irradiation. It is proposed that the Ar ions removed the carbon contamination. LAY DESCRIPTION: Organic materials, including carbon, exist inside the transmission electron microscope (TEM) chamber and are adsorbed onto samples under observation during TEM. When these adsorbed organic materials are irradiated by an electron beam, the adsorbed gas is decomposed. Carbon atoms remain on the sample and bond with each other forming a material with an amorphous structure. Due to the carbon deposition on the observation area of the sample, it is contaminated and the TEM image quality is decreased. Ar was introduced into environmental TEM (ETEM) to purge organic material from the sample chamber to reduce contamination growth. After Ar gas was introduced, the contamination was gradually removed. The contamination removal rate was dependent on the Ar pressure. Moreover, it was clear that Ar was ionised by electron beam irradiation and the Ar ions were produced in the ETEM during electron beam irradiation. It is proposed that the Ar ions removed the carbon contamination.

摘要

包括碳在内的有机物质存在于透射电子显微镜(TEM)腔室内,并在TEM观察期间吸附到被观察的样品上。当这些吸附的有机物质受到电子束照射时,吸附的气体就会分解。碳原子留在样品上并相互结合,形成一种具有非晶结构的材料。由于碳沉积在样品的观察区域,样品受到污染,TEM图像质量下降。将氩气引入环境透射电子显微镜(ETEM)以清除样品腔室中的有机物质,以减少污染物的增长。引入氩气后,污染物逐渐被清除。污染物的清除率取决于氩气压力。此外,很明显氩气在电子束照射下被电离,并且在ETEM中电子束照射期间产生氩离子。有人提出氩离子去除了碳污染。

简要说明

包括碳在内的有机物质存在于透射电子显微镜(TEM)腔室内,并在TEM观察期间吸附到被观察的样品上。当这些吸附的有机物质受到电子束照射时,吸附的气体就会分解。碳原子留在样品上并相互结合,形成一种具有非晶结构的材料。由于碳沉积在样品的观察区域,样品受到污染,TEM图像质量下降。将氩气引入环境透射电子显微镜(ETEM)以清除样品腔室中的有机物质,以减少污染物的增长。引入氩气后,污染物逐渐被清除。污染物的清除率取决于氩气压力。此外,很明显氩气在电子束照射下被电离,并且在ETEM中电子束照射期间产生氩离子。有人提出氩离子去除了碳污染。

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