Lee Myungsup, Heo Sungbo, Kim Wang Ryeol, Kim Hyundong, Kim Myung Hyun, Park In-Wook, Kim Yangdo
School of Materials Science and Engineering, Pusan National University, Busan, KS012, South Korea.
Korea Institute of Industrial Technology (KITECH), Yangsan, KS011, South Korea.
J Nanosci Nanotechnol. 2019 Feb 1;19(2):1082-1085. doi: 10.1166/jnn.2019.15966.
Functional graded Ti-Al-Si-N-O nanocomposite films were deposited onto WC-Co substrate by a filtered arc ion plating system using TiAl and TiSi composite targets under N₂/Ar atmosphere. XRD and XPS analyses revealed that the synthesized Ti-Al-Si-N-O films were nanocomposite consisting of nanosized (Ti, Al, Si)N crystallites embedded in an amorphous Si₃N₄/SiO₂ matrix. The hardness of the Ti-Al-Si-N-O films exhibited the maximum hardness values of ~47 GPa at a Si content of ~5.63 at.% due to the microstructural change to a nanocomposite as well as the solid-solution hardening. Besides, Ti-Al-Si-N-O film with Si content of around 5.63 at.% also showed perfect adhesive strength value of 105.3 N. These excellent mechanical properties of Ti-Al-Si-N-O films could be help to improve the performance of machining tools and cutting tools with application of the film. A comparative study on microstructural characteristics among Ti-Al-Si-N-O films with various Si contents is reported in this paper.
采用过滤电弧离子镀系统，在N₂/Ar气氛下，使用TiAl和TiSi复合靶材，在WC-Co基体上沉积功能梯度Ti-Al-Si-N-O纳米复合薄膜。XRD和XPS分析表明，合成的Ti-Al-Si-N-O薄膜是一种纳米复合材料，由嵌入非晶Si₃N₄/SiO₂基体中的纳米尺寸(Ti, Al, Si)N微晶组成。由于微观结构转变为纳米复合材料以及固溶强化，Ti-Al-Si-N-O薄膜的硬度在Si含量约为5.63 at.%时表现出约47 GPa的最大硬度值。此外，Si含量约为5.63 at.%的Ti-Al-Si-N-O薄膜还显示出105.3 N的完美结合强度值。Ti-Al-Si-N-O薄膜的这些优异力学性能有助于通过薄膜的应用提高加工工具和切削工具的性能。本文报道了不同Si含量的Ti-Al-Si-N-O薄膜微观结构特征的对比研究。
