Kim Wang Ryeol, Heo Sungbo, Kim Hyundong, Kim Jun-Ho, Park In-Wook, Chung Wonsub
Korea Institute of Industrial Technology (KITECH), Yangsan 50635, Republic of Korea.
School of Materials Science and Engineering, Pusan National University, Busan 46241, Republic of Korea.
J Nanosci Nanotechnol. 2020 Jul 1;20(7):4394-4397. doi: 10.1166/jnn.2020.17605.
High temperature oxidation behavior of nanocomposite films is very important characteristics for application of machining and cutting tools. Quaternary Cr-Al-Si-N nanocomposite films with various compositions were deposited onto WC-Co and Si wafer substrates using a filtered arc ion plating technique. The composition of the films were controlled by different combinations of CrAl₂ and Cr₄Si composite target power in a reactive gas mixture of high purity Ar and N₂ during depositions. The instrumental analyses revealed that the synthesized Cr-Al-Si-N films with Si content of 2.78 at.% were nanocomposites consisting of nano-sized crystallites (3-7 nm in dia.) and a thin layer of amorphous Si₃N₄ phases. The nanohardness of the Cr-Al-Si-N films exhibited the maximum values of ~42 GPa at a Si content of ~2.78 at.% due to the microstructural change to nanocomposite as well as solid-solution hardening. The Cr-Al-Si-N film shows superior result of oxidation resistance at 1050 °C for 30 min in air. Based on the XRD and GDOES analyses on the oxidized films, it could be revealed that the enrichment of Al (17.94 at.%) and Cr (26.24 at.%) elements in the film leads to form an Al₂O₃ and Cr₂O₃ layer on the Cr-Al-Si-N film surface. Therefore, in this study, the microstructural changes on the mechanical properties and oxidation behavior with various compositions in the Cr-Al-Si-N nanocomposite films were discussed and correlated with the deposition parameters.
纳米复合薄膜的高温氧化行为是加工和切削刀具应用的非常重要的特性。采用过滤电弧离子镀技术，在WC-Co和硅片衬底上沉积了具有不同成分的四元Cr-Al-Si-N纳米复合薄膜。在沉积过程中，通过在高纯氩气和氮气的反应气体混合物中，不同组合的CrAl₂和Cr₄Si复合靶功率来控制薄膜的成分。仪器分析表明，合成的Si含量为2.78 at.%的Cr-Al-Si-N薄膜是由纳米尺寸的微晶（直径3-7nm）和非晶态Si₃N₄相薄层组成的纳米复合材料。由于微观结构转变为纳米复合材料以及固溶强化，Cr-Al-Si-N薄膜的纳米硬度在Si含量约为2.78 at.%时表现出最大值~42 GPa。Cr-Al-Si-N薄膜在空气中1050℃下氧化30分钟表现出优异的抗氧化性能。基于对氧化薄膜的XRD和GDOES分析，可以发现薄膜中Al（17.94 at.%）和Cr（26.24 at.%）元素的富集导致在Cr-Al-Si-N薄膜表面形成Al₂O₃和Cr₂O₃层。因此，在本研究中，讨论了Cr-Al-Si-N纳米复合薄膜中不同成分对力学性能和氧化行为的微观结构变化，并与沉积参数相关联。
