Heo Sungbo, Lee Myungsup, Kim Hyundong, Kim Wang Ryeol, Kim Jun-Ho, Park In-Wook, Kim Daeil
Korea Institute of Industrial Technology, Yangsan 50635, South Korea.
School of Materials Science and Engineering, Pusan National University, Busan 46241, South Korea.
J Nanosci Nanotechnol. 2019 Jul 1;19(7):4195-4198. doi: 10.1166/jnn.2019.16274.
Oxidation behavior of nanocomposite films is very important characteristics for application of machining and cutting tools. In this study, Ti-Al-Si-N-O nanocomposite films were fabricated onto WC-Co and Si wafer substrates. The composition of the Ti-Al-Si-N-O films was analyzed by X-ray photo-electron spectroscope (XPS). Also X-ray diffactometer (XRD) analysis was conducted to investigate the crystallinity and phase transformation of the films. As a result of XRD, Ti-Al(18 at.%)-Si-N-O films showed the great oxidation resistance of 950 °C for 30 min in air. Based on glow discharge optical emission spectroscopy (GDOES) depth profiles, Ti-Al(18 at.%)- Si-N-O film annealed at 950 °C for 30 min shows formation of aluminum oxide layer on the film surface. On the other hand, Ti-Al(7.56 at.%)-Si-N-O film had a titanium oxide layer on the surface after annealing at 950 °C for 30 min.
纳米复合薄膜的氧化行为是其在机械加工和切削刀具应用中的非常重要的特性。在本研究中，在WC-Co和硅片衬底上制备了Ti-Al-Si-N-O纳米复合薄膜。通过X射线光电子能谱仪（XPS）分析了Ti-Al-Si-N-O薄膜的成分。还进行了X射线衍射仪（XRD）分析以研究薄膜的结晶度和相变。XRD结果表明，Ti-Al（18原子百分比）-Si-N-O薄膜在空气中950℃下30分钟具有很高的抗氧化性。基于辉光放电光发射光谱（GDOES）深度剖析，在950℃下退火30分钟的Ti-Al（18原子百分比）-Si-N-O薄膜在薄膜表面形成了氧化铝层。另一方面，在950℃下退火30分钟后，Ti-Al（7.56原子百分比）-Si-N-O薄膜表面有一层氧化钛层。
