Haydous F, Scarisoreanu N D, Birjega R, Ion V, Lippert T, Dumitrescu N, Moldovan A, Andrei A, Teodorescu V S, Ghica C, Negrea R, Dinescu M
Paul Scherrer Institut, Villigen, Switzerland.
National Institute for Laser, Plasma and Radiation Physics, 077125, Magurele, Romania.
Sci Rep. 2018 Oct 25;8(1):15826. doi: 10.1038/s41598-018-34010-9.
We report significant photoelectrochemical activity of Y-doped BiFeO (Y-BFO) epitaxial thin films deposited on Nb:SrTiO substrates. The Y-BFO photoanodes exhibit a strong dependence of the photocurrent values on the thickness of the films, and implicitly on the induced epitaxial strain. The peculiar crystalline structure of the Y-BFO thin films and the structural changes after the PEC experiments have been revealed by high resolution X-ray diffraction and transmission electron microscopy investigations. The crystalline coherence breaking due to the small ionic radius Y-addition was analyzed using Willliamson-Hall approach on the 2θ-ω scans of the symmetric (00 l) reflections and confirmed by high resolution TEM (HR-TEM) analysis. In the thinnest sample the lateral coherence length (L) is preserved on larger nanoregions/nanodomains. For higher thickness values L is decreasing while domains tilt angles (α) is increasing. The photocurrent value obtained for the thinnest sample was as high as J = 0.72 mA/cm, at 1.4 V(vs. RHE). The potentiostatic scans of the Y-BFO photoanodes show the stability of photoresponse, irrespective of the film's thickness. There is no clear cathodic photocurrent observation for the Y-BFO thin films confirming the n-type semiconductor behavior of the Y-BFO photoelectrodes.
我们报道了沉积在Nb:SrTiO衬底上的Y掺杂BiFeO(Y-BFO)外延薄膜具有显著的光电化学活性。Y-BFO光阳极的光电流值强烈依赖于薄膜的厚度,并且隐含地依赖于诱导的外延应变。通过高分辨率X射线衍射和透射电子显微镜研究揭示了Y-BFO薄膜独特的晶体结构以及PEC实验后的结构变化。利用威廉姆森-霍尔方法对对称(00 l)反射的2θ-ω扫描分析了由于添加小离子半径Y导致的晶体相干破坏,并通过高分辨率TEM(HR-TEM)分析得到证实。在最薄的样品中,横向相干长度(L)在较大的纳米区域/纳米畴上得以保留。对于更高的厚度值,L减小而畴倾斜角(α)增大。在1.4 V(相对于RHE)时,最薄样品获得的光电流值高达J = 0.72 mA/cm²。Y-BFO光阳极的恒电位扫描显示光响应具有稳定性,与薄膜厚度无关。对于Y-BFO薄膜,未观察到明显的阴极光电流,证实了Y-BFO光电极的n型半导体行为。