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利用扫描电化学显微镜研究 MoS 中的电子转移

Mapping Electron Transfer at MoS Using Scanning Electrochemical Microscopy.

机构信息

Theiss Research , P.O. Box 127, La Jolla , California 92038 , United States.

Maryland NanoCenter , University of Maryland , College Park , Maryland 20742 , United States.

出版信息

Langmuir. 2018 Nov 20;34(46):13864-13870. doi: 10.1021/acs.langmuir.8b02731. Epub 2018 Nov 8.

Abstract

Understanding the role of macroscopic and atomic defects in the interfacial electron transfer properties of layered transition metal dichalcogenides is important in optimizing their performance in energy conversion and electronic devices. Means of determining the heterogeneous electron transfer rate constant, k, have relied on the deliberate exposure of specific electrode regions or additional surface characterization to correlate proposed active sites to voltammetric features. Few studies have investigated the electrochemical activity of surface features of layered dichalcogenides under the same experimental conditions. Herein, MoS flakes with well-defined features were mapped using scanning electrochemical microscopy (SECM). At visually flat areas of MoS, k of hexacyanoferrate(III) ([Fe(CN)]) and hexacyanoferrate(II) ([Fe(CN)]) was typically smaller and spanned a larger range than that of hexaammineruthenium(III) ([Ru(NH)]), congruent with the current literature. However, in contrast to previous studies, the reduction of [Fe(CN)] and the oxidation of [Fe(CN)] exhibited similar rate constants, attributed to the dominance of charge transfer through surface states. The comparison of SECM with optical and atomic force microscopy images revealed that while most of the flake was electroactive, edge sites associated with freshly exposed areas that include macrosteps consisting of several monolayers as well as recessed areas exhibited the highest reactivity, consistent with the reported results.

摘要

了解层状过渡金属二卤化物界面电子转移性质中宏观和原子缺陷的作用对于优化其在能量转换和电子设备中的性能非常重要。确定非均相电子转移速率常数 k 的方法依赖于故意暴露特定电极区域或进行额外的表面特征化,以将提出的活性位点与伏安特征相关联。很少有研究在相同的实验条件下研究层状二卤化物表面特征的电化学活性。在此,使用扫描电化学显微镜(SECM)对具有明确定义特征的 MoS 薄片进行了映射。在 MoS 的视觉平坦区域,六氰合铁(III)([Fe(CN)]) 和六氰合铁(II)([Fe(CN)]) 的 k 值通常比六氨合钌(III)([Ru(NH)]) 更小且范围更大,与当前文献一致。然而,与先前的研究相反,[Fe(CN)]的还原和[Fe(CN)]的氧化表现出相似的速率常数,这归因于通过表面态进行电荷转移的主导作用。SECM 与光学和原子力显微镜图像的比较表明,虽然大部分薄片具有电化学活性,但与新暴露区域相关的边缘位点,包括由几个单层组成的宏观台阶以及凹陷区域,表现出最高的反应性,与报道的结果一致。

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