Jiang Chenchen, Hu Dayong, Lu Yang
Department of Mechanical and Biomedical Engineering, City University of Hong Kong, Kowloon, Hong Kong, China.
Center for Advanced Structural Materials (CASM), Shenzhen Research Institute, City University of Hong Kong, Shenzhen 518057, China.
Micromachines (Basel). 2016 Mar 14;7(3):49. doi: 10.3390/mi7030049.
Fatigue behavior of nanomaterials could ultimately limit their applications in variable nano-devices and flexible nanoelectronics. However, very few existing nanoscale mechanical testing instruments were designed for dedicated fatigue experiments, especially for the challenging torsional cyclic loading. In this work, a novel high-cycle torsion straining micromachine, based on the digital micromirror device (DMD), has been developed for the torsional fatigue study on various one-dimensional (1D) nanostructures, such as metallic and semiconductor nanowires. Due to the small footprint of the DMD chip itself and its cable-remote controlling mechanisms, it can be further used for the desired testing under high-resolution optical or electron microscopes (e.g., scanning electron microscope (SEM)), which allows real-time monitoring of the fatigue testing status and construction of useful structure-property relationships for the nanomaterials. We have then demonstrated its applications for testing nanowire samples with diameters about 100 nm and 500 nm, up to 1000 nm, and some of them experienced over hundreds of thousands of loading cycles before fatigue failure. Due to the commercial availability of the DMD and millions of micromirrors available on a single chip, this platform could offer a low-cost and high-throughput nanomechanical solution for the uncovered torsional fatigue behavior of various 1D nanostructures.
纳米材料的疲劳行为最终可能会限制它们在可变纳米器件和柔性纳米电子学中的应用。然而,现有的纳米级机械测试仪器中,专门用于疲劳实验的很少,尤其是针对具有挑战性的扭转循环加载。在这项工作中,一种基于数字微镜器件(DMD)的新型高循环扭转应变微机械已被开发出来,用于研究各种一维(1D)纳米结构(如金属和半导体纳米线)的扭转疲劳。由于DMD芯片本身占地面积小及其电缆远程控制机制,它可以进一步用于在高分辨率光学或电子显微镜(如扫描电子显微镜(SEM))下进行所需的测试,这允许实时监测疲劳测试状态并构建纳米材料有用的结构 - 性能关系。然后,我们展示了它在测试直径约100nm、500nm直至1000nm的纳米线样品中的应用,其中一些样品在疲劳失效前经历了数十万次加载循环。由于DMD的商业可用性以及单个芯片上有数百万个微镜,该平台可以为各种一维纳米结构未被揭示的扭转疲劳行为提供低成本、高通量的纳米力学解决方案。