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用于Bi-Te热电元件化学镀Ni-P的湿蚀刻方法

Wet Etching Method for Electroless Ni-P Plating of Bi-Te Thermoelectric Element.

作者信息

Bae Sung Hwa, Jo Hyo Jae, Son Injoon, Sohn Ho-Sang, Kim Kyung Tae

机构信息

School of Materials Science and Engineering, Kyungpook National University, 80 Daehakro, Buk-gu, Daegu 41566, Korea.

Powder and Ceramic Materials Division, Korea Institute of Materials Science, 797 Chanwon-daero, Seongsan-gu, Changwon, Gyeongnam 51508, Korea.

出版信息

J Nanosci Nanotechnol. 2019 Mar 1;19(3):1749-1754. doi: 10.1166/jnn.2019.16247.

Abstract

In this study, a method for electroless Ni-P plating with excellent adhesion via chemical wet etching to fabricate Bi-Te thermoelectric modules is proposed. The electroless Ni-P plating formed through the proposed method showed excellent adherence without peeling, even under heat treatment of 200 °C for 24 h. Wet etching and electroless Ni-P plating was performed on a Bi-Te thermoelectric module, which showed the excellent bond strength of approximately 10 MPa. The surface roughness of the Bi-Te thermoelectric element was increased significantly by the wet etching process, which secured the adherence of the Ni-P plating by anchoring to this induced surface roughness.

摘要

在本研究中,提出了一种通过化学湿法蚀刻进行具有优异附着力的化学镀镍磷的方法,用于制造铋碲热电模块。通过该方法形成的化学镀镍磷镀层即使在200℃热处理24小时的情况下也表现出优异的附着力,无剥落现象。在铋碲热电模块上进行了湿法蚀刻和化学镀镍磷,其显示出约10MPa的优异结合强度。湿法蚀刻工艺显著增加了铋碲热电元件的表面粗糙度,通过锚固到这种诱导的表面粗糙度来确保镍磷镀层的附着力。

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