Cerqueira Carolina, Qin Jian Yin, Dang Huong, Djeffal Abdelhak, Le Breton Jean-Christophe, Hehn Michel, Rojas-Sanchez Juan-Carlos, Devaux Xavier, Suire Stéphane, Migot Sylvie, Schieffer Philippe, Mussot Jean-Georges, Łaczkowski Piotr, Anane Abdelmadjid, Petit-Watelot Sebastien, Stoffel Mathieu, Mangin Stéphane, Liu Zhi, Cheng Bu Wen, Han Xiu Feng, Jaffrès Henri, George Jean-Marie, Lu Yuan
Unité Mixte de Physique, CNRS, Thales, Université Paris-Sud, Université Paris-Saclay , 91767 , Palaiseau , France.
Laboratoire des Solides Irradiés, École Polytechnique, CNRS, CEA , Université Paris-Saclay , 91128 Palaiseau , France.
Nano Lett. 2019 Jan 9;19(1):90-99. doi: 10.1021/acs.nanolett.8b03386. Epub 2018 Dec 4.
Due to the difficulty of growing high-quality semiconductors on ferromagnetic metals, the study of spin diffusion transport in Si was limited to lateral geometry devices. In this work, by using an ultrahigh-vacuum wafer-bonding technique, we have successfully fabricated metal-semiconductor-metal CoFeB/MgO/Si/Pt vertical structures. We hereby demonstrate pure spin-current injection and transport in the perpendicular current flow geometry over a distance larger than 2 μm in n-type Si at room temperature. In those experiments, a pure propagating spin current is generated via ferromagnetic resonance spin pumping and converted into a measurable voltage by using the inverse spin Hall effect occurring in the top Pt layer. A systematic study varying both Si and MgO thicknesses reveals the important role played by the localized states at the MgO-Si interface for the spin-current generation. Proximity effects involving indirect exchange interactions between the ferromagnet and the MgO-Si interface states appears to be a prerequisite to establishing the necessary out-of-equilibrium spin population in Si under the spin-pumping action.
由于在铁磁金属上生长高质量半导体存在困难,硅中自旋扩散输运的研究仅限于横向几何结构器件。在这项工作中,通过使用超高真空晶圆键合技术,我们成功制备了金属-半导体-金属CoFeB/MgO/Si/Pt垂直结构。我们在此展示了在室温下,在n型硅中垂直电流流动几何结构中,纯自旋电流在超过2μm的距离上的注入和输运。在这些实验中,通过铁磁共振自旋泵浦产生纯传播自旋电流,并利用顶部Pt层中发生的逆自旋霍尔效应将其转换为可测量的电压。对硅和氧化镁厚度变化的系统研究揭示了氧化镁-硅界面处的局域态在自旋电流产生中所起的重要作用。涉及铁磁体与氧化镁-硅界面态之间间接交换相互作用的近邻效应似乎是在自旋泵浦作用下在硅中建立必要的非平衡自旋载流子的先决条件。