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龋齿中唾液脂质过氧化终产物水平的评估。

Evaluation of Salivary Lipid Peroxidation End Product Level in Dental Caries.

作者信息

Ahmadi-Motamayel Fatemeh, Hendi Seyede Sareh, Goodarzi Mohammad Taghi

机构信息

Department of Oral Medicine, Dental Implant Research Center and Dental Research Center, Hamadan University of Medical Sciences, Hamadan, Iran.

Department of Endodontics, Dental School, Hamadan University of Medical Sciences, Hamadan, Iran.

出版信息

Infect Disord Drug Targets. 2020;20(1):65-68. doi: 10.2174/1871526519666181123182120.

Abstract

BACKGROUND

Tissue destruction can be measured by the level of lipid peroxidation (LP) end products. Since free radicals are very reactive with low survival time, the level of free radicals and oxidative stress activity are measured indirectly by tissue damage end product assessment, i.e. Malondialdehyde (MDA) that is a final end product of LP.

OBJECTIVE

The aim of this study was to evaluate salivary MDA level as an indicator of oxidative stress; in caries-active and caries-free students.

METHODS

A total of 100 male and female students, 15-17 years of age, participated in this casecontrol study. Five mL of whole saliva was obtained. Salivary MDA level was measured spectrophotometrically. Statistical comparisons were performed with Student's t-test, using SPSS 13.

RESULTS

Salivary MDA level was significantly higher in the caries-active group compared to the control caries-free group. MDA was also slightly lower in males.

CONCLUSION

Higher MDA level might indicate caries-induced oxidative stress. In this study there was a relationship between salivary MDA level and dental caries. Therefore oxidative stress suppression might prevent caries initiation and progression.

摘要

背景

组织破坏程度可通过脂质过氧化(LP)终产物水平来衡量。由于自由基反应活性很强且存活时间短,自由基水平和氧化应激活性通过组织损伤终产物评估间接测定,即丙二醛(MDA),它是LP的最终终产物。

目的

本研究旨在评估唾液MDA水平作为氧化应激指标在患龋活跃和无龋学生中的情况。

方法

共有100名15 - 17岁的男女学生参与了这项病例对照研究。采集5毫升全唾液。采用分光光度法测量唾液MDA水平。使用SPSS 13软件进行学生t检验统计比较。

结果

与无龋对照组相比,患龋活跃组的唾液MDA水平显著更高。男性的MDA水平也略低。

结论

较高的MDA水平可能表明龋齿诱导的氧化应激。在本研究中,唾液MDA水平与龋齿之间存在关联。因此,抑制氧化应激可能预防龋齿的发生和进展。

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