Kwak Hyeon-Tak, Jang Kyu-Won, Kim Hyun-Jung, Lee Sang-Heung, Lim Jong-Won, Kim Hyun-Seok
Division of Electronics and Electrical Engineering, Dongguk University-Seoul, Seoul 04620, South Korea.
Electronics and Telecommunications Research Institute, Daejeon 34129, South Korea.
J Nanosci Nanotechnol. 2019 Apr 1;19(4):2319-2322. doi: 10.1166/jnn.2019.16004.
We investigate DC characteristics of AlGaN/GaN high-electron mobility transistors by using a source-bridged field plate and additional bottom plate (BP) structure. The analysis of experimental data was performed with a two-dimensional simulator. Source connected BP structure stabilized threshold voltage and transconductance regardless of various drain voltages. The effect of BP location was also analyzed, which had optimal DC values because of the dependence of breakdown voltage and drain current of the device on BP position between gate and drain. Finally, the optimum distance of 0.8 m from drain side gate head edge to BP was achieved for optimum DC characteristics and the highest breakdown voltage of 341 V.
