Institute of Semiconductor Physics, Pr. Lavrentyeva 13, Novosibirsk 630090, Russia.
Department of Physics and I3N, University of Aveiro, Campus Santiago, 3810-193 Aveiro, Portugal.
J Chem Phys. 2018 Nov 28;149(20):204702. doi: 10.1063/1.5048064.
We report on the investigation of the atomic and electronic structures of a clean Si(331)-(12 × 1) surface using a first-principles approach with both plane wave and strictly localized basis sets. Starting from the surface structure proposed by Zhachuk and Teys [Phys. Rev. B , 041412(R) (2017)], we develop significant improvements to the atomic model and localized basis set which are critical for the correct description of the observed bias dependence of scanning tunneling microscopy (STM) images. The size mismatch between the Si pentamers from the surface model and those seen by STM is explained within the context of the Tersoff-Hamann model. The energy barriers that separate different Si(331) buckled configurations were estimated, showing that the surface structure is prone to dynamic buckling at room temperature. It is found that empty electronic states on Si(331) are essentially localized on the pentamers with interstitials and under-coordinated Si -like atoms between them, while filled electronic states are localized on under-coordinated Si -like atoms and dimers on trenches. The calculated electronic density of states exhibits two broad peaks in the fundamental bandgap of Si: one near the valence band top and the other near the conduction band bottom. The resulting surface bandgap of 0.58 eV is in an excellent agreement with spectroscopy studies.
我们采用第一性原理平面波和严格局域基组方法,研究了清洁 Si(331)-(12×1)表面的原子和电子结构。从 Zhachuk 和 Teys 提出的表面结构[Phys. Rev. B, 041412(R) (2017)]出发,我们对原子模型和局域基组进行了重要改进,这对于正确描述扫描隧道显微镜(STM)图像的偏置依赖性至关重要。表面模型中的 Si 五聚体与 STM 观察到的五聚体之间的尺寸不匹配,在 Tersoff-Hamann 模型的框架内得到了解释。我们还估计了分离不同 Si(331) 褶皱构型的能量势垒,表明表面结构在室温下容易发生动态褶皱。结果表明,Si(331)上的空电子态本质上局域在具有间隙和其间配位不足的 Si 样原子的五聚体上,而填充电子态局域在配位不足的 Si 样原子和沟槽上的二聚体上。计算得到的态密度在 Si 的基本带隙中显示出两个宽峰:一个靠近价带顶,另一个靠近导带底。由此得到的 0.58 eV 的表面带隙与光谱研究非常吻合。