Ishioka Kunie, Beyer Andreas, Stolz Wolfgang, Volz Kerstin, Petek Hrvoje, Höfer Ulrich, Stanton Christopher J
National Institute for Materials Science, Tsukuba, 305-0047, Japan.
J Phys Condens Matter. 2019 Mar 6;31(9):094003. doi: 10.1088/1361-648X/aaf84d. Epub 2018 Dec 12.
Thin GaP films can be grown on an exact Si(0 0 1) substrate with nearly perfect lattice match. We perform all-optical pump-probe measurements to investigate the ultrafast electron-phonon coupling at the buried interface of GaP/Si. Above-bandgap excitation with a femtosecond laser pulse can induce coherent longitudinal optical (LO) phonons both in the GaP overlayer and in the Si substrate. The coupling of the GaP LO phonons with photoexcited plasma is reduced significantly with decreasing GaP layer thickness from 56 to 16 nm due to the quasi-two-dimensional confinement of the plasma. The same laser pulse can also generate coherent longitudinal acoustic phonons in the form of a strain pulse. The strain pulse induces not only a periodic modulation in the optical reflectivity as it propagates in the semiconductor, but also a sharp spike when it arrives at the GaP layer boundary. The acoustic pulse induced at the GaP/Si interface is remarkably stronger than that at the Si surface, suggesting a possible application of the GaP/Si heterostructure as an opto-acoustic transducer. The amplitude and the phase of the reflectivity modulation varies with the GaP layer thickness, which can be understood in terms of the interference caused by the multiple acoustic pulses generated at the top surface and at the buried interface.
薄的GaP薄膜可以生长在具有近乎完美晶格匹配的精确Si(0 0 1)衬底上。我们进行全光泵浦-探测测量,以研究GaP/Si掩埋界面处的超快电子-声子耦合。用飞秒激光脉冲进行带隙以上激发,可以在GaP覆盖层和Si衬底中诱导出相干纵向光学(LO)声子。由于等离子体的准二维限制,随着GaP层厚度从56 nm减小到16 nm,GaP LO声子与光激发等离子体的耦合显著降低。相同的激光脉冲还可以产生应变脉冲形式的相干纵向声学声子。应变脉冲在半导体中传播时不仅会引起光学反射率的周期性调制,而且在到达GaP层边界时还会产生一个尖锐的尖峰。在GaP/Si界面处诱导的声脉冲明显比在Si表面处的声脉冲更强,这表明GaP/Si异质结构作为光声换能器具有潜在的应用价值。反射率调制的幅度和相位随GaP层厚度而变化,这可以通过顶面和掩埋界面处产生的多个声脉冲引起的干涉来理解。