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单层过渡金属二硫属化物/金属结中层间电荷转移动力学的调制。

Modulated interlayer charge transfer dynamics in a monolayer TMD/metal junction.

机构信息

National Laboratory of Solid State Microstructures, Collaborative Innovation Center of Advanced Microstructures, School of Electronic Science and Engineering, Nanjing University, Nanjing 210093, People's Republic of China.

出版信息

Nanoscale. 2019 Jan 3;11(2):418-425. doi: 10.1039/c8nr08728h.

Abstract

The performance of optoelectronic devices based on monolayer transition-metal dichalcogenide (mTMD) semiconductors is significantly affected by the contact at the mTMD-metal interface, which is dependent on interlayer interactions and coupling. Here, we report a systematic optical method to investigate the interlayer charge transfer and coupling in a mTMD-metal heterojunction. Giant photoluminescence (PL) quenching was observed in a monolayer MoS2/Pd (1L MoS2/Pd) junction which is mainly due to the efficient interlayer charge transfer between Pd and MoS2. 1L MoS2/Pd also exhibits an increase in the PL quenching factor (η) as the temperature decreases, due to a reduction of the interlayer spacing. Annealing experiments were also performed which supported interlayer charge transfer as the main mechanism for the increase of η. Moreover, a monolayer MoS2/Au (1L MoS2/Au) junction was fabricated for engineering the interlayer charge transfer. Interestingly, a narrowing effect of the full width at half maximum (FWHM) was encountered as the junctions changed from 1L MoS2/SiO2 → 1L MoS2/Au → 1L MoS2/Pd, possibly originating from a change of the doping level induced weakening of exciton-carrier scattering. Our results deepen the understanding of metal-semiconductor junctions for further exploring fundamental phenomena and enabling high-performance devices using mTMD-metal junctions.

摘要

基于单层过渡金属二卤化物(mTMD)半导体的光电设备的性能受到 mTMD-金属界面处接触的显著影响,这取决于层间相互作用和耦合。在这里,我们报告了一种系统的光学方法来研究 mTMD-金属异质结中的层间电荷转移和耦合。在单层 MoS2/Pd(1L MoS2/Pd)结中观察到巨大的光致发光(PL)猝灭,这主要是由于 Pd 和 MoS2 之间的有效层间电荷转移。1L MoS2/Pd 还表现出随着温度降低 PL 猝灭因子(η)增加,这是由于层间间距减小所致。还进行了退火实验,支持层间电荷转移是 η 增加的主要机制。此外,还制造了单层 MoS2/Au(1L MoS2/Au)结来工程化层间电荷转移。有趣的是,当结从 1L MoS2/SiO2→1L MoS2/Au→1L MoS2/Pd 变化时,半高全宽(FWHM)遇到了变窄的效果,可能源自掺杂水平变化引起的激子-载流子散射减弱。我们的结果加深了对金属半导体结的理解,以进一步探索使用 mTMD-金属结的基本现象并实现高性能器件。

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