National Laboratory of Solid State Microstructures, Collaborative Innovation Center of Advanced Microstructures, School of Electronic Science and Engineering, Nanjing University, Nanjing 210093, People's Republic of China.
Nanoscale. 2019 Jan 3;11(2):418-425. doi: 10.1039/c8nr08728h.
The performance of optoelectronic devices based on monolayer transition-metal dichalcogenide (mTMD) semiconductors is significantly affected by the contact at the mTMD-metal interface, which is dependent on interlayer interactions and coupling. Here, we report a systematic optical method to investigate the interlayer charge transfer and coupling in a mTMD-metal heterojunction. Giant photoluminescence (PL) quenching was observed in a monolayer MoS2/Pd (1L MoS2/Pd) junction which is mainly due to the efficient interlayer charge transfer between Pd and MoS2. 1L MoS2/Pd also exhibits an increase in the PL quenching factor (η) as the temperature decreases, due to a reduction of the interlayer spacing. Annealing experiments were also performed which supported interlayer charge transfer as the main mechanism for the increase of η. Moreover, a monolayer MoS2/Au (1L MoS2/Au) junction was fabricated for engineering the interlayer charge transfer. Interestingly, a narrowing effect of the full width at half maximum (FWHM) was encountered as the junctions changed from 1L MoS2/SiO2 → 1L MoS2/Au → 1L MoS2/Pd, possibly originating from a change of the doping level induced weakening of exciton-carrier scattering. Our results deepen the understanding of metal-semiconductor junctions for further exploring fundamental phenomena and enabling high-performance devices using mTMD-metal junctions.
基于单层过渡金属二卤化物(mTMD)半导体的光电设备的性能受到 mTMD-金属界面处接触的显著影响,这取决于层间相互作用和耦合。在这里,我们报告了一种系统的光学方法来研究 mTMD-金属异质结中的层间电荷转移和耦合。在单层 MoS2/Pd(1L MoS2/Pd)结中观察到巨大的光致发光(PL)猝灭,这主要是由于 Pd 和 MoS2 之间的有效层间电荷转移。1L MoS2/Pd 还表现出随着温度降低 PL 猝灭因子(η)增加,这是由于层间间距减小所致。还进行了退火实验,支持层间电荷转移是 η 增加的主要机制。此外,还制造了单层 MoS2/Au(1L MoS2/Au)结来工程化层间电荷转移。有趣的是,当结从 1L MoS2/SiO2→1L MoS2/Au→1L MoS2/Pd 变化时,半高全宽(FWHM)遇到了变窄的效果,可能源自掺杂水平变化引起的激子-载流子散射减弱。我们的结果加深了对金属半导体结的理解,以进一步探索使用 mTMD-金属结的基本现象并实现高性能器件。