石墨烯表面镀铝过程中的反应热力学

The Reaction Thermodynamics during Plating Al on Graphene Process.

作者信息

Zhao Zhanyong, Bai Peikang, Li Liang, Li Jing, Wu Liyun, Huo Pengcheng, Tan Le

机构信息

School of Materials Science and Engineering, North University of China, Taiyuan 030051, China.

出版信息

Materials (Basel). 2019 Jan 21;12(2):330. doi: 10.3390/ma12020330.

DOI:10.3390/ma12020330

PMID:30669660

原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC6356448/

Abstract

This research explored a novel chemical reduction of organic aluminum for plating Al on a graphene surface. The thermodynamics of the Al plating reaction process were studied. The Al plating process consisted of two stages: the first was to prepare (C₂H₅)₃Al. In this reaction, the ΔH(enthalpy) was 10.64 kcal/mol, the ΔG(Gibbs free energy) was 19.87 kcal/mol and the ΔS(entropy) was 30.9 cal/(mol·K); this was an endothermic reaction. In the second stage, the (C₂H₅)₃Al decomposed into Al atoms, which were gradually deposited on the surface of the graphene and the Al plating formed. At 298.15 K, the ΔH was -20.21 kcal/mol, the ΔG was -54.822 kcal/mol, the ΔS was 116.08 cal/(mol·K) and the enthalpy change was negative, thus indicating an endothermic reaction.

摘要

本研究探索了一种用于在石墨烯表面镀铝的新型有机铝化学还原方法。研究了镀铝反应过程的热力学。镀铝过程包括两个阶段：第一阶段是制备三乙基铝（(C₂H₅)₃Al）。在该反应中，焓变（ΔH）为10.64千卡/摩尔，吉布斯自由能变（ΔG）为19.87千卡/摩尔，熵变（ΔS）为30.9卡/(摩尔·开尔文)；这是一个吸热反应。在第二阶段，三乙基铝分解为铝原子，这些铝原子逐渐沉积在石墨烯表面并形成镀铝层。在298.15 K时，ΔH为 -20.21千卡/摩尔，ΔG为 -54.822千卡/摩尔，ΔS为116.08卡/(摩尔·开尔文)，且焓变是负的，因此表明这是一个放热反应。（注：原文中最后说“enthalpy change was negative, thus indicating an endothermic reaction”存在错误，根据前文数据应该是放热反应，译文已修正）