Zhao Yangyang, Li Jiuyong, Qiu Ranfeng, Shi Hongxin
School of Materials Science and Engineering, Henan University of Science and Technology, Luoyang 471039, China.
Henan Key Laboratory of Advanced Non-ferrous Metals, Luoyang 471003, China.
Materials (Basel). 2019 Feb 4;12(3):472. doi: 10.3390/ma12030472.
Ti-Al diffusion couples, prepared by resistance spot welding, were annealed up to 112 hours at 823, 848, and 873 K in ambient atmosphere. The interfacial microstructure was observed and analyzed using SEM and TEM. The growth characterization of intermetallic compound formed at the Ti/Al solid state interface was investigated. Only TiAl₃ phase was detected in the interfacial zone, and its growth was governed by reaction-controlled mechanism in the previous period and by diffusion-controlled mechanism in the latter period. The activation energies were 198019 and 122770 J/mol for reaction-controlled and diffusion-controlled mechanism, respectively.
通过电阻点焊制备的Ti-Al扩散偶在环境气氛中于823、848和873 K下退火长达112小时。使用扫描电子显微镜（SEM）和透射电子显微镜（TEM）观察和分析界面微观结构。研究了在Ti/Al固态界面形成的金属间化合物的生长特性。在界面区域仅检测到TiAl₃相，其生长前期受反应控制机制支配，后期受扩散控制机制支配。反应控制机制和扩散控制机制的活化能分别为198019和122770 J/mol。
