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薄膜黑磷的明亮中红外光致发光。

Bright Mid-Infrared Photoluminescence from Thin-Film Black Phosphorus.

机构信息

Department of Electrical Engineering , Yale University , New Haven , Connecticut 06511 , United States.

Department of Electrical and Computer Engineering , University of Illinois Urbana-Champaign , Champaign , Illinois 61801 , United States.

出版信息

Nano Lett. 2019 Mar 13;19(3):1488-1493. doi: 10.1021/acs.nanolett.8b04041. Epub 2019 Feb 20.

Abstract

Recently rediscovered layered black phosphorus (BP) provides rich opportunities for investigations of device physics and applications. The band gap of BP is widely tunable by its layer number and a vertical electric field, covering a wide electromagnetic spectral range from visible to mid-infrared. Despite much progress in BP optoelectronics, the fundamental photoluminescence (PL) properties of thin-film BP in mid-infrared have rarely been investigated. Here, we report bright PL emission from thin-film BP (with thickness of 4.5 to 46 nm) from 80 to 300 K. The PL measurements indicate a band gap of 0.308 ± 0.003 eV in 46 nm thick BP at 80 K, and it increases monotonically to 0.334 ± 0.003 eV at 300 K. Such an anomalous blueshift agrees with the previous theoretical and photoconductivity spectroscopy results. However, the observed blueshift of 26 meV from 80 to 300 K is about 60% of the previously reported value. Most importantly, we show that the PL emission intensity from thin-film BP is only a few times weaker than that of an indium arsenide (InAs) multiple quantum well (MQW) structure grown by molecular beam epitaxy. Finally, we report the thickness-dependent PL spectra in thin-film BP in mid-infrared regime. Our work reveals the mid-infrared light emission properties of thin-film BP, suggesting its promising future in tunable mid-infrared light emitting and lasing applications.

摘要

最近重新发现的层状黑磷 (BP) 为研究器件物理和应用提供了丰富的机会。BP 的带隙可以通过其层数和垂直电场进行广泛调节,覆盖从可见光到中红外的广泛电磁光谱范围。尽管 BP 光电学取得了很大进展,但很少研究中红外薄膜 BP 的基本光致发光 (PL) 特性。在这里,我们报告了从 80 到 300 K 的薄膜 BP(厚度为 4.5 到 46nm)的明亮 PL 发射。PL 测量表明,在 80 K 时 46nm 厚的 BP 的带隙为 0.308±0.003eV,在 300 K 时单调增加到 0.334±0.003eV。这种异常的蓝移与先前的理论和光导光谱结果一致。然而,从 80 到 300 K 观察到的 26meV 的蓝移仅约为先前报道值的 60%。最重要的是,我们表明,从薄膜 BP 发出的 PL 发射强度仅比分子束外延生长的砷化铟 (InAs) 多量子阱 (MQW) 结构弱几个数量级。最后,我们报告了中红外区域薄膜 BP 的厚度相关 PL 光谱。我们的工作揭示了薄膜 BP 的中红外光发射特性,表明其在可调谐中红外发光和激光应用中有广阔的前景。

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