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MoTe FETs 中的缺陷相关光电流。

Defect-Affected Photocurrent in MoTe FETs.

出版信息

ACS Appl Mater Interfaces. 2019 Mar 13;11(10):10068-10073. doi: 10.1021/acsami.9b00050. Epub 2019 Feb 26.

Abstract

Imperfections in the crystal lattice, such as defects, grain boundaries, or dislocations, can significantly affect the optical and electrical transport properties of materials. In this study, we report the effect of mid gap trap states on photocurrent in 10 atomic layered 2H-MoTe. Our study reveals that the photocurrent is very sensitive to the number of active traps, which can be controlled by V. By fitting the measured transient drain current, our estimation shows that the trap-state density is approximately 5 × 10 cm. By analyzing the photocurrent data as a function of the gate voltage, we realize how the ionized traps affect the photoexcited carriers. The model of hole traps, electron traps, and recombination centers inside the band gap successfully describes our observed results.

摘要

晶格中的不完美,如缺陷、晶界或位错,会显著影响材料的光学和电子输运性质。在这项研究中,我们报告了 10 层原子 2H-MoTe 中隙态陷阱对光电流的影响。我们的研究表明,光电流对活性陷阱的数量非常敏感,而这可以通过 V 来控制。通过拟合测量的瞬态漏电流,我们的估算表明,陷阱态密度约为 5×10^12 cm^-3。通过分析光电流数据作为栅极电压的函数,我们了解了离子化陷阱如何影响光激发载流子。带隙内空穴陷阱、电子陷阱和复合中心的模型成功地描述了我们观察到的结果。

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