Department of Physics , University of South Florida , Tampa , Florida 33620 , United States.
Department of Applied Physics , Aalto University , 00076 Aalto , Finland.
ACS Nano. 2018 Apr 24;12(4):3975-3984. doi: 10.1021/acsnano.8b01580. Epub 2018 Apr 12.
Phase engineering has extensively been used to achieve metallization of two-dimensional (2D) semiconducting materials, as it should boost their catalytic properties or improve electrical contacts. In contrast, here we demonstrate compositional phase change by incorporation of excess metals into the crystal structure. We demonstrate post-synthesis restructuring of the semiconducting MoTe or MoSe host material by unexpected easy incorporation of excess Mo into their crystal planes, which causes local metallization. The amount of excess Mo can reach values as high as 10% in MoTe thus creating a significantly altered material compared to its parent structure. The incorporation mechanism is explained by density functional theory in terms of the energy difference of Mo atoms incorporated in the line phases as compared to Mo ad-clusters. Angle resolved photoemission spectroscopy reveals that the incorporated excess Mo induces band gap states up to the Fermi level causing its pinning at these electronic states. The incorporation of excess transition metals in MoTe and MoSe is not limited to molybdenum, but other transition metals can also diffuse into the lattice, as demonstrated experimentally by Ti deposition. The mechanism of incorporation of transition metals in MoSe and MoTe is revealed, which should help to address the challenges in synthesizing defect-free single layer materials by, for example, molecular beam epitaxy. The easy incorporation of metal atoms into the crystal also indicates that the previously assumed picture of a sharp metal/2D-material interface may not be correct, and at least for MoSe and MoTe, in-diffusion of metals from metal-contacts into the 2D material has to be considered. Most importantly though, the process of incorporation of transition metals with high concentrations into pristine 2D transition-metal dichalcogenides enables a pathway for their post-synthesis modifications and adding functionalities.
相工程已被广泛用于实现二维(2D)半导体材料的金属化,因为它应该能提高它们的催化性能或改善电接触。相比之下,我们在这里展示了通过在晶体结构中掺入过量金属来实现组成相的变化。我们通过将过量的钼意外地容易地掺入到它们的晶体平面中来展示半导体 MoTe 或 MoSe 主体材料的合成后重构,这导致了局部金属化。过量钼的含量可以达到 MoTe 中的 10%,与母体结构相比,形成了显著改变的材料。掺入机制通过密度泛函理论用掺入线相中的钼原子与钼吸附团簇的能量差来解释。角分辨光电子能谱揭示了掺入的过量钼诱导能带隙态直到费米能级,导致其在这些电子态处被钉扎。过量过渡金属在 MoTe 和 MoSe 中的掺入不仅限于钼,而且其他过渡金属也可以扩散到晶格中,如 Ti 沉积的实验所证明的那样。揭示了过渡金属在 MoSe 和 MoTe 中的掺入机制,这应该有助于解决通过分子束外延等方法合成无缺陷单层材料的挑战。金属原子很容易掺入晶体中,这表明之前假设的金属/2D 材料界面的尖锐图像可能不正确,至少对于 MoSe 和 MoTe 而言,必须考虑金属从金属接触到 2D 材料的内扩散。然而,最重要的是,将高浓度的过渡金属掺入原始的 2D 过渡金属二卤化物中的过程为它们的合成后修饰和添加功能提供了途径。