Advanced Nano-Surface Group, Korea Basic Science Institute (KBSI), 169-148 Gwahak-ro, Yuseong-gu, Daejeon 34133, Republic of Korea.
Nanotechnology. 2019 Jun 7;30(23):235301. doi: 10.1088/1361-6528/ab077d. Epub 2019 Feb 15.
One-dimensional (1D) and three-dimensional (3D) residue-free metal oxide patterns are directly fabricated over large areas using liquid transfer imprint lithography (LTIL) with an ultraviolet-curable metal oxide precursor resist. A 1D line or pillar array of metal oxides nano-patterns without a residual layer is formed by LTIL and annealing processes. A 3D layer-by-layer nanomesh structure is successfully constructed by repeating the LTIL method without a complex etching process. In addition, it is possible to form a hierarchical structure in which zinc oxide nanowires are selectively grown on a desired zinc oxide (ZnO) seed pattern formed by LTIL via a hydrothermal method. Unlike the pattern fabricated by the conventional nanoimprint lithography method, in the case of the pattern formed by LTIL the residues accumulated between the patterns during the patterning procedure can be removed, and thus it is possible to easily form various types of nanostructures.
采用紫外光固化金属氧化物前驱体光刻胶的液体转移压印光刻技术（LTIL），可在大面积上直接制备一维（1D）和三维（3D）无残留金属氧化物图案。通过 LTIL 和退火工艺，可以形成具有无残留层的 1D 线或柱阵列金属氧化物纳米图案。通过重复 LTIL 方法而无需复杂的刻蚀工艺，成功构建了 3D 层层纳米网结构。此外，还可以通过水热法在通过 LTIL 形成的所需氧化锌（ZnO）种子图案上选择性地生长氧化锌纳米线，从而形成分层结构。与通过传统纳米压印光刻法形成的图案不同，在通过 LTIL 形成的图案的情况下，可以去除图案形成过程中图案之间积累的残留物，因此可以轻松形成各种类型的纳米结构。
