Chandra Sushmita, Biswas Kanishka
New Chemistry Unit, School of Advanced Materials and International Centre of Materials Science , Jawaharlal Nehru Centre for Advanced Scientific Research , Jakkur P.O., Bangalore 560064 , India.
J Am Chem Soc. 2019 Apr 17;141(15):6141-6145. doi: 10.1021/jacs.9b01396. Epub 2019 Apr 8.
Recently single crystals of layered SnSe have created a paramount importance in thermoelectrics owing to their ultralow lattice thermal conductivity and high thermoelectric figure of merit ( zT). However, nanocrystalline or polycrystalline SnSe offers a wide range of thermoelectric applications for the ease of its synthesis and machinability. Here, we demonstrate high zT of ∼2.1 at 873 K in two-dimensional nanoplates of Ge-doped SnSe synthesized by a simple hydrothermal route followed by spark plasma sintering (SPS). Anisotropic measurements also show a high zT of ∼1.75 at 873 K parallel to the SPS pressing direction. Ge doping (3 mol %) in SnSe nanoplates significantly enhances the p-type carrier concentration, which results in high electrical conductivity and power factor of ∼5.10 μW/cm K at 873 K. High lattice anharmonicity, nanoscale grain boundaries, and Ge precipitates in the SnSe matrix synergistically give rise to the ultralow lattice thermal conductivity of ∼0.18 W/mK at 873 K.
最近,层状SnSe单晶因其超低的晶格热导率和高热电优值(zT)而在热电领域具有至关重要的意义。然而,纳米晶或多晶SnSe因其易于合成和可加工性而具有广泛的热电应用。在此,我们展示了通过简单水热法合成并随后进行放电等离子烧结(SPS)制备的Ge掺杂SnSe二维纳米片中,在873 K时具有约2.1的高zT。各向异性测量还表明,在873 K时,平行于SPS压制方向具有约1.75的高zT。SnSe纳米片中的Ge掺杂(3 mol%)显著提高了p型载流子浓度,这导致了高电导率和在873 K时约5.10 μW/cm K的功率因子。高晶格非谐性、纳米级晶界以及SnSe基体中的Ge沉淀协同作用,使得在873 K时具有约0.18 W/mK的超低晶格热导率。